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Jauberteau, Jean-Louis; Thomas, L.; Aubreton, J.; Jauberteau, Isabelle; Catherinot, A.

doi:10.1023/a:1021797428416

Cited by 22 publications

(22 citation statements)

References 10 publications

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“…The CH 4 flow was set to the value Q CH4 = 30 sccm and the pumping system was adapted by a throttle valve to maintain constant pressure p tot = 1 Pa. Besides proper methane CH 4 , the methane atmosphere shows the presence of various radicals and molecules of the CH y , C 2 H y even C 3 H y type . Absolute quantity of individual components decreases with increasing number of carbon atoms C. Detailed survey of the detected molecules and radicals of the C x H y type (where x = 1–3) is shown in Figure b.…”

Section: Resultsmentioning

confidence: 99%

“…Various ideas about the changes of the ECR methane discharge with or without argon into above mentioned radicals and ions are known from literature:

{Ar (}^{3} {normalP}_{2}) + {C H}_{4} \to {C H}_{2} + 2 H + A r

\to C H + {normalH}_{2} + H + A r

\to {C H}_{3} + H + A r

and, in case of C 2 H y type radicals:

{C H}_{2} + {C H}_{3} \to {normalC}_{2} {normalH}_{4} + H

{C H}_{3} + {C H}_{3} \to {normalC}_{2} {normalH}_{6} .

…”

Section: Discussionmentioning

confidence: 99%

“…It has been also established that the methane discharge is electropositive and that the electron structure changes with the methane pressure in the processing chamber, as well as with the partial pressure of CH 4 . At the same time, they found that high ionization of the discharge depends on the supplied inductive power . Other authors measured and carried out mathematical simulations of the plasma potential, electron density, and electron energy distribution …”

Section: Introductionmentioning

confidence: 99%

“…[21,22] Some authors modeled the processes in the CH 4 /Ar discharge and investigated primarily the production and influence of the CH 3 and CH 2 radicals and its ions on the formation of the layers, calculated the diffusion coefficients and electron kinetics. [8,[23][24][25] It has been also established that the methane discharge is electropositive and that the electron structure changes with the methane pressure in the processing chamber, as well as with the partial pressure of CH 4 . At the same time, they found that high ionization of the discharge depends on the supplied inductive power.…”

Section: Introductionmentioning

confidence: 99%

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A Detailed Investigation of Radicals and Ions in ECR Methane/Argon Microwave Discharge

Pokorný

Mišina

Novotný

et al. 2016

Plasma Processes & Polymers

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In this work, we focus on study of the formation and behavior of molecules, radicals, and ions in ECR discharge in a mixture of argon and methane. Discharge properties are studied at various conditions; total gas flow (0-50 sccm), absorbed microwave power (0-900 W) and the partial pressure of methane (0-1.2 Pa). Neutral mass spectrometry does not reveal the presence of radical CH 5 commonly described in literature. Spectra show the presence of atomic hydrogen H and especially H 2 molecules. The number of CH 4 þ and CH 3 þ species shows that the amount of CH 4 þ in areas power up to 350 W is high, but with further increase of the power their amount decreases. With the increasing power the CH 3 þ ions are more intensively generated. The obtained data helps optimize process conditions for the fabrication of diamond and DLC thin films.

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Section: Resultsmentioning

confidence: 99%

“…Various ideas about the changes of the ECR methane discharge with or without argon into above mentioned radicals and ions are known from literature:

{Ar (}^{3} {normalP}_{2}) + {C H}_{4} \to {C H}_{2} + 2 H + A r

\to C H + {normalH}_{2} + H + A r

\to {C H}_{3} + H + A r

and, in case of C 2 H y type radicals:

{C H}_{2} + {C H}_{3} \to {normalC}_{2} {normalH}_{4} + H

{C H}_{3} + {C H}_{3} \to {normalC}_{2} {normalH}_{6} .

…”

Section: Discussionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

A Detailed Investigation of Radicals and Ions in ECR Methane/Argon Microwave Discharge

Pokorný

Mišina

Novotný

et al. 2016

Plasma Processes & Polymers

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show abstract

“…Metastable argon atoms are of sufficient energy to initiate dissociation of organic substances and the lifetime of metastable argon atoms can be as long as 1.3 s . While the direct electron impact reactions occur only during the active discharge portion of the applied AC voltage, metastable argon atoms can contribute to the chemistry in the whole AC cycle (46 µs period in the present system).…”

Section: Resultsmentioning

confidence: 94%

Study on the Reaction of CCl₂F₂with CH₄in a Dielectric Barrier Discharge Nonequilibrium Plasma

Kundu

Kennedy

Mackie

et al. 2013

Plasma Process. Polym.

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The reaction of CCl2F2 (CFC‐12) with methane (in an argon bath gas) in a dielectric barrier discharge (DBD) non‐thermal plasma reactor at atmospheric pressure has been investigated. The reaction (where oxygen and nitrogen are excluded from the feed gas) produced a range of gas phase products, including H2, HCl, HF, CHF3, CF3CH2F, CHClF2, CH3Cl, CH2ClF, CH2Cl2, CHCl2F and CHCl3 as well as solid products which were primarily non‐crosslinked polymers. The conversion of CCl2F2 increased, from 44 to 71%, when the input energy density of the plasma was raised from 3 to 13 kJ · L−1 (applied voltage range is 13.4–14.8 kV, peak‐peak). The relatively low input feed concentration of CCl2F2 and methane in the argon bath gas modifies the strong filamentary appearance of the pure argon discharge to a more diffuse appearance.

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Advances of microwave plasma-enhanced chemical vapor deposition in fabrication of carbon nanotubes: a review

Liu

Zhang

et al. 2021

J Mater Sci

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Untitled

Cited by 22 publications

References 10 publications

A Detailed Investigation of Radicals and Ions in ECR Methane/Argon Microwave Discharge

A Detailed Investigation of Radicals and Ions in ECR Methane/Argon Microwave Discharge

Study on the Reaction of CCl₂F₂with CH₄in a Dielectric Barrier Discharge Nonequilibrium Plasma

Advances of microwave plasma-enhanced chemical vapor deposition in fabrication of carbon nanotubes: a review

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Untitled

Cited by 22 publications

References 10 publications

A Detailed Investigation of Radicals and Ions in ECR Methane/Argon Microwave Discharge

A Detailed Investigation of Radicals and Ions in ECR Methane/Argon Microwave Discharge

Study on the Reaction of CCl2F2with CH4in a Dielectric Barrier Discharge Nonequilibrium Plasma

Advances of microwave plasma-enhanced chemical vapor deposition in fabrication of carbon nanotubes: a review

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Study on the Reaction of CCl₂F₂with CH₄in a Dielectric Barrier Discharge Nonequilibrium Plasma