5 nm Nanogap Electrodes and Arrays by Super-resolution Laser Lithography

Qin, Liang; Huang, Yuanqing; Xia, Feng; Wang, Lei; Ning, Jiqiang; Chen, Hongmei; Wang, Xu; Zhang, Wei; Peng, Yong; Liu, Qian; Zhang, Ziyang

doi:10.1021/acs.nanolett.0c00978

Cited by 50 publications

(32 citation statements)

References 47 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…[144,145] The latter has already shown promising opportunities for fabrication structures in sub-10 nm range. [146,147] Table 1 gives a brief comparison of the techniques mentioned above. It is clear that each technique has its own advantages and disadvantages.…”

Section: Template Fabrication By Lithography Techniquesmentioning

confidence: 99%

Metallic Plasmonic Array Structures: Principles, Fabrications, Properties, and Applications

et al. 2021

View full text Add to dashboard Cite

can efficiently couple light into nanostructures and confine light below diffraction limit. [8,9] With these properties, plasmonics have found important applications in various fields such as plasmonic sensing, [10][11][12][13] plasmon-enhanced spectroscopies, [14][15][16] plasmonic nanolasing, [17][18][19] and perfect light absorption. [20,21] The optical performances of plasmonic nanostructures are highly dependent on the resonance modes that they support. Generally, there are two fundamental surface plasmonic modes: localized surface plasmon resonance (LSPR) and propagating surface plasmon polaritons (SPP). [22,23] LSPR can be observed on metal nanoparticles. [22,24,25] However, the strong radiative damping of metal nanoparticles results in broad resonant spectra, severely limiting the applications of metal nanoparticles in fields such as plasmonic sensing and nanolasing. [26,27] SPP is usually generated at the interface between metal and dielectric with the assistance of a high refractive index prism or by constructing a grating structure. [23,28,29] The near-field decay length of SPP mode is 40-50 times larger than that of LSPR mode. [23] Therefore, SPP structures usually provide higher bulk sensitivity when used for plasmonic sensing. [23] However, it is difficult to achieve a flexible tuning of SPP mode only by above configurations. In addition, single resonance mode also greatly limits the applications of the devices.According to the plasmon hybridization theory, coupling of different resonance modes can endow plasmonic nanostructures with richer optical properties and thereby improve their performance and broaden their application fields. [30][31][32] Metallic plasmonic arrays have been demonstrated to be a powerful platform for the simultaneous excitation of the above two basic types of plasmonic modes. [33,34] In addition, they can also support many other types of resonance modes such as Fabry-Pérot (F-P) cavity mode, surface lattice resonance (SLR), and plasmonic Fano resonance due to the flexibility in structure design. [32,[35][36][37][38] These modes together give the nanostructured plasmonic arrays with attractive performance unattainable by using individual LSPR or SPP mode. Benefited from the abundant optical properties, nanostructured metallic plasmonic arrays can be utilized in a fashion of "device-by-design." For example, for plasmonic sensing, a plasmonic array with a narrow spectrum can be fabricated for an excellent sensing performance; [23,26] while for surface-enhanced Raman spectroscopy (SERS) detection, a plasmonic array with a relatively broad spectrum is needed to achieve local field enhancement and radiative enhancement simultaneously. [39,40] Therefore, the investigation The vast development of nanofabrication has spurred recent progress for the manipulation of light down to a region much smaller than the wavelength. Metallic plasmonic array structures are demonstrated to be the most powerful platform to realize controllable light-matter interactions and have found wide application...

show abstract

Section: Template Fabrication By Lithography Techniquesmentioning

confidence: 99%

Metallic Plasmonic Array Structures: Principles, Fabrications, Properties, and Applications

et al. 2021

View full text Add to dashboard Cite

show abstract

“…Competing chemical activation and deactivation effects with shaped light beams or nonlinear physical effects with Gaussian beams can avoid the Abbe limit and create features on the scale of 10 nm or even below. [11][12][13][14][15][16][17][18] Although the resolution of DLW is approaching that of EBL, it is still unable to achieve large and small features in one step.…”

Section: Introductionmentioning

confidence: 99%

Laser‐Assisted Thermal Exposure Lithography: Arbitrary Feature Sizes

et al. 2021

View full text Add to dashboard Cite

In traditional optical exposure lithography, the feature size is restricted by the Abbe limit, and it is difficult to obtain patterns with a feature size smaller or larger than the optical spot itself. Herein, a laser-assisted thermal exposure lithography technique is reported where the feature size can be arbitrarily tuned and changed, and is not limited to the spot size. The minimum feature size of the obtained patterns is 90 nm, which is %1/7 of the laser spot size (0.62 μm). The corresponding aspect ratio is %1:1. The maximum feature size is 2.7 μm, which is %30 times the minimum feature size. A variety of multiscale and multifunctional structures with different feature sizes are obtained successfully through a highspeed laser-assisted thermal exposure system, where the writing speed is more than 10 m s À1 . This method offers a pathway for direct laser writing with arbitrary feature sizes, high throughput, and low cost.

show abstract

“…The thicknesses of the EO film and the ITO layer are 50 nm. It should be noted that the nano-slits can be realized via the standard atomic layer lithography technique [48], super-resolution laser lithography [49], and the cascade domino lithography [50], which have been developed in these years and demonstrated for sub-5 nm nano-gap and slit fabrication. For instance, split-wedge antennas with sub-5 nm nano-gaps were realized based on these techniques [48,51].…”

Section: Introductionmentioning

confidence: 99%

High-Performance Electro-Optic Manipulation by Plasmonic Light Absorber With Nano-Cavity Field Confinement

Liu

et al. 2021

IEEE Photonics J.

View full text Add to dashboard Cite

：Narrowband light absorber with multi-band plasmonic resonances is numerically investigated for high-performance electrical manipulation via introducing the electro-optic (EO) medium in the slit array based grating structure. A maximal absorption efficiency of 99.5% is achieved. The spectral shift sensitivity reaches 0.99 nm/V. Besides, the large spectral intensity change is also obtained due to the use of sharp resonances, which therefore ensures the high signal-to-noise ratio for the manipulation process. It is observed that the strong surface plasmon resonance and the localized optical cavity modes can introduce the differential responses for the multiple modes under the optical adjusting process and also for the EO manipulation process. These features not only contribute to produce the new EO modulator platforms based on the light absorbers but also pave new ways for the cavity-enhanced high-performance EO operation. Moreover, the absorption properties can be well maintained in a wide range of the structural parameters, indicating the high tolerance of the fabrication process. The findings can pave new insights into the high-performance manipulations via the narrowband absorbers with strong electromagnetic field enhancement and hold wide applications in dynamic switching, filtering, displaying, etc.

show abstract

5 nm Nanogap Electrodes and Arrays by Super-resolution Laser Lithography

Cited by 50 publications

References 47 publications

Metallic Plasmonic Array Structures: Principles, Fabrications, Properties, and Applications

Metallic Plasmonic Array Structures: Principles, Fabrications, Properties, and Applications

Laser‐Assisted Thermal Exposure Lithography: Arbitrary Feature Sizes

High-Performance Electro-Optic Manipulation by Plasmonic Light Absorber With Nano-Cavity Field Confinement

Contact Info

Product

Resources

About