40 Jahre industrielles Magnetron‐Sputtern in Europa

Seyfert, Ulf; Heisig, U.; Teschner, G.; Strümpfel, J.

doi:10.1002/vipr.201500596

Cited by 8 publications

(6 citation statements)

References 3 publications

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“…High energy ball milling (HEBM) [29,30] is one of the most common methods for silicon alloy preparation because of its simple operation and energy efficiency. With the advancing technology, promising methods have been devised for the synthesis of silicon-based alloys, such as magnetron sputtering (MS), [31,32] pulsed laser deposition (PLD), [33,34] and electron beam evaporation (EBE). [35] The chemical methods include chemical vapor deposition (CVD), [36,37] electrostatic spray deposition (ESD), [38] and spin-coating technique.…”

Section: Synthesis Of Silicon-based Alloysmentioning

confidence: 99%

Microstructure Engineered Silicon Alloy Anodes for Lithium‐Ion Batteries: Advances and Challenges

Zheng

Sun

Liu

et al. 2022

Batteries & Supercaps

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Due to the high theoretical lithium storage capacity and moderate voltage platform, silicon is expected to substitute graphite and serves as the most promising anode material for lithium-ion batteries (LIBs). However, substantial volume change during cycling subjects the silicon anode to electrode pulverization and conductive network damage, extensively limiting its commercial purpose. Strategies, such as alloying, nano-crystallization, and compositing, are developed against these problems. This review introduces the attractive alloying modification method and summarizes the recent advances in microstructureengineered silicon alloy anodes for LIBs. The electrochemical performances of silicon alloy anodes with various morphologies, such as nanoparticles, nanowires, two-dimensional layered structures, porous structures, and thin films, are discussed in detail. The challenges for the commercial application of silicon alloy anodes are elaborated in the end. This review provides a comprehensive overview and concerns of microstructure-engineered silicon alloy anodes for potential applications in LIBs.

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Section: Synthesis Of Silicon-based Alloysmentioning

confidence: 99%

Microstructure Engineered Silicon Alloy Anodes for Lithium‐Ion Batteries: Advances and Challenges

Zheng

Sun

Liu

et al. 2022

Batteries & Supercaps

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“…Finally, the target is vaporized and the vapors are deposited on the substrate, creating a thin atomic layer. The entire procedure takes place in a vacuum chamber in the presence of low pressure plasma (0.67 Pa) [66].…”

Section: Sonochemical and Microwave-assisted Methodsmentioning

confidence: 99%

Titanium Dioxide in Chromogenic Devices: Synthesis, Toxicological Issues, and Fabrication Methods

2020

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The use of titanium dioxide (TiO2) within two specific classes of devices, namely electrochromic and photoelectrochromic, is described hereafter, with respect to its inherent properties and chromogenic features within architectures that have appeared so far, in this field. The new research trends, involving the applications of TiO2 in chromogenic materials are reported, with particular attention paid to the techniques used for film deposition as well as the synthesis of nanoparticles. Furthermore, the main studies concerning its chemical-physical properties and approaches to its chemical syntheses and fabrication are reviewed, with special regard to “green” routes. In addition, the main aspects relating to toxicological profiles are exposed, with reference to nanoparticles and thin films.

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“…Approximately 50 years ago, the development of sputtering technology progressed greatly and was characterized by successes in improving deposition rates, process stability, and cost efficiency in the following years. At present, magnetron sputtering is widely known as a reliable and cost‐effective coating process that has already become established in numerous industries [8]. The MSIP‐PVD process is also known as cathode sputtering and can be used for the deposition of metallic coatings (e.g., Ti, Al, Cr), nitride coatings (e.g., CrAlN, TiAlN, TiN, CrN), or oxide ceramic coatings (e.g., Al 2 O 3 , Cr 2 O 3 ).…”

Section: Magnetron Sputter Ion Plating (Msip)mentioning

confidence: 99%

Formation of pure anatase TiO₂ using the reactive pulsed dc magnetron sputtering method for controlling the target poisoning state

Desch

Lake

2023

Applied Research

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The use of pulsed dc‐sputtering sources for reactive magnetron sputtering with oxygen offers a possibility to suppress the negative effects of target poisoning (such as arcing). This results in a wide process range for the selection of a desired operating point. The control of target poisoning plays a major role in maintaining constant coating properties and affects the stoichiometry of the reactive coating, as well as the coating rate and the economic impact of the coating process. In a hysteresis, the target poisoning during the reactive sputtering of titanium under oxygen addition proceeds nonlinearly. Without the use of a suitable target poisoning control technique, the sputtering process can abruptly change to an unstable state. As a result, variations of stoichiometry can occur during the deposition process. A proven method for maintaining a stable reactive sputtering process is the control of oxygen flow with the input variable target voltage. By determining the typical oxygen hysteresis at constant target power and constant argon flow, an operating point for the control loop is derived. The desired target voltage then serves as the input variable for the control loop of the target poisoning. The controlling technique for target poisoning is a basic requirement for the production of the photolytic active anatase phase of titanium dioxide (TiO2) using reactive magnetron sputtering. The photocatalytic equipment of surfaces with a titanium dioxide coating in the anatase phase can be realized with the reactive pulsed dc magnetron sputter ion plating process (DC‐MSIP). The pulsed DC‐MSIP process facilitates coating a variety of surfaces at temperatures below 200°C in an environmentally friendly manner.

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40 Jahre industrielles Magnetron‐Sputtern in Europa

Cited by 8 publications

References 3 publications

Microstructure Engineered Silicon Alloy Anodes for Lithium‐Ion Batteries: Advances and Challenges

Microstructure Engineered Silicon Alloy Anodes for Lithium‐Ion Batteries: Advances and Challenges

Titanium Dioxide in Chromogenic Devices: Synthesis, Toxicological Issues, and Fabrication Methods

Formation of pure anatase TiO₂ using the reactive pulsed dc magnetron sputtering method for controlling the target poisoning state

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40 Jahre industrielles Magnetron‐Sputtern in Europa

Cited by 8 publications

References 3 publications

Microstructure Engineered Silicon Alloy Anodes for Lithium‐Ion Batteries: Advances and Challenges

Microstructure Engineered Silicon Alloy Anodes for Lithium‐Ion Batteries: Advances and Challenges

Titanium Dioxide in Chromogenic Devices: Synthesis, Toxicological Issues, and Fabrication Methods

Formation of pure anatase TiO2 using the reactive pulsed dc magnetron sputtering method for controlling the target poisoning state

Contact Info

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Resources

About

Formation of pure anatase TiO₂ using the reactive pulsed dc magnetron sputtering method for controlling the target poisoning state