40-100nm contact hole processes of ZEP520A e-beam resist on PCM prototyping applications

Chen, Wei-Su; Chuo, Yen; Hsu, Hong-Hui; Chen, Yi-Chan; Lee, Chien-Min; Kao, Ming-Jer; Tsai, Ming-Jinn

doi:10.1117/12.656192

SPIE Proceedings

2006

DOI: 10.1117/12.656192

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40-100nm contact hole processes of ZEP520A e-beam resist on PCM prototyping applications

Wei-Su Chen

Yen Chuo

Hong-Hui Hsu

et al.

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40-100nm contact hole processes of ZEP520A e-beam resist on PCM prototyping applications

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