3D nanoprinting via focused electron beams

Abstract

Additive manufacturing of three-dimensional objects on the nanoscale is a very relevant topic but still a highly challenging task. Among the pool of nanofabrication techniques, focused electron beam induced deposition (FEBID) has recently developed from a trial-and-error laboratory method to a predictable 3D nanoprinting technology with unique advantages. This perspective article first introduces the basic principles of 3D-FEBID, followed by an overview of historical developments with a particular emphasis on the last three years. Here, we examine different aspects of 3D nanoprinting such as the instrumental setup, fundamental growth mechanisms, simulations, computer aided design software solutions, material properties, and application studies. For each aspect, the individual challenges and limitations are discussed. In addition, we share our outlook about possible solutions and studies currently under investigation. As a perspective, we also address the most urgent milestones of the future and speculate on applications ranging from optics to mechanics, magnetics, and electronics, all of them benefiting from the recently improved 3D FEBID synthesis technique.

Temperature-Dependent Growth Characteristics of Nb- and CoFe-Based Nanostructures by Direct-Write Using Focused Electron Beam-Induced Deposition

“…Over the last few years, this has led to the evolution of a simulation-guided 3D computer aided design (CAD) approach which was pioneered by Fowlkes and collaborators [11] and has been further developed towards a reliable instrument for 3D nano-fabrication even of complex nano-architectures, as was recently reviewed by Winkler et al [12]. For the fields of 3D nano-magnetism and nano-superconductivity, the precursors Co 2 (CO) 8 [1], Fe 2 (CO) 9 [13], HCo 3 Fe(CO) 12 [3] (FEBID), W(CO) 6 [14], and Nb(NMe 3 ) 2 (N-t-Bu) [7] (FIBID) have been used and proven to be particularly suited. With a view to the simulation-guided 3D CAD approach to nano-fabrication which uses the continuum model of FEBID/FIBID growth, a set of simulation parameters is required; see Reference [15] for a recent review.…”

“…With a view to the simulation-guided 3D CAD approach to nano-fabrication which uses the continuum model of FEBID/FIBID growth, a set of simulation parameters is required; see Reference [15] for a recent review. Here, we focus on the precursors HCo 3 Fe(CO) 12 and Nb(NMe 3 ) 2 (N-t-Bu), recently introduced by us, and provide the activation energies and pre-exponential factors for thermally induced precursor desorption from a series of FEBID experiments performed under low beam current conditions (I = 30 pA) on Si(100)/SiO 2 substrates held at different temperatures between 5 • C and 24 • C. By comparison with deposition results obtained under high beam current conditions (I = 1.6 nA), we highlight the morphological consequences imposed by the change of the growth regime from reaction-rate limited or diffusion enhanced to mass-transport limited. We note that similar experiments with FIBID, as would seem to be natural for the Nb-precursor, cannot be done for deduction of the activation energies due to the unavoidable etching effect in parallel to the growth; see Reference [15] for details.…”

Layer-by-Layer Growth of Complex-Shaped Three-Dimensional Nanostructures with Focused Electron Beams

“…43,44 These works make an important step towards controllable nanoscale 3D printing of networks of nanowires, correcting effectively for various phenomena present in FEBID when growing pseudo-1D elements using different approaches. 12 To exploit the full potential of FEBID as a 3D fabrication tool, however, the nanoprinting protocol needs to be redefined in order to generalize it to more complex geometries.…”

Additive Nano-Lithography with Focused Soft X-rays: Basics, Challenges, and Opportunities

“…Several recent studies have demonstrated that focused electron beam induced processing (FEBIP) has high potential for the controlled bottom-up fabrication of metallic 3D nanostructures [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. Furthermore, the basic processes during FEBIP are understood to more and more detail leading to developments towards more diverse, cleaner and more defined deposits for various potential applications [7,[15][16][17][18].…”

“…Dissociation is generated mainly by low-and medium-energy secondary or backscattered electrons which have a high interaction cross-section with matter. Depending on the substrate and the chemical composition of the targeted nanostructure, several in-situ and ex-situ cleaning procedures have been developed [14,19,20].…”