Abstract:A "virtual reactor" methodology for optimal design of a rapid thermal processor (RW) to obtain the best possible wafer temperature uniformity is described in this paper. Given the equipment configuration, e.g., the lamp array, a threedimensional simulator is used to predict the wafer temperature profiles for various lamp array designs for different processing conditions. The only experimental input needed is the spatial light flux distribution of the individual tungsten-halogen bulb which forms the lamp array.… Show more
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