3D micro patterning on a concave substrate for creating the replica of a cylindrical PDMS stamp

Park, Jongho; Kim, Beomjoon

doi:10.1016/j.mee.2012.07.034

Cited by 11 publications

(5 citation statements)

References 17 publications

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“…Microcontact printing using cylindrical polydimethylsiloxane (PDMS) stamps has since been reported [ 19 ]. However, it was not possible to create various angles on a single substrate by flattening the curved substrates bearing the microstructures.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Polymer Microstructures of Various Angles via Synchrotron X-Ray Lithography Using Simple Dimensional Transformation

et al. 2018

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In this paper, we developed a method of fabricating polymer microstructures at various angles on a single substrate via synchrotron X-ray lithography coupled with simple dimensional transformations. Earlier efforts to create various three-dimensional (3D) features on flat substrates focused on the exposure technology, material properties, and light sources. A few research groups have sought to create microstructures on curved substrates. We created tilted microstructures of various angles by simply deforming the substrate from 3D to two-dimensional (2D). The microstructural inclination angles changed depending on the angles of the support at particular positions. We used convex, concave, and S-shaped supports to fabricate microstructures with high aspect ratios (1:11) and high inclination angles (to 79°). The method is simple and can be extended to various 3D microstructural applications; for example, the fabrication of microarrays for optical components, and tilted micro/nanochannels for biological applications.

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Section: Introductionmentioning

confidence: 99%

Fabrication of Polymer Microstructures of Various Angles via Synchrotron X-Ray Lithography Using Simple Dimensional Transformation

et al. 2018

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“…SU-8, polydimethylsiloxane (PDMS), etc) have expanded the field of 3D microstructure fabrication [12][13][14]. The exposure method has been developed as well [12,[15][16][17][18][19][20][21].…”

Section: Introductionmentioning

confidence: 99%

Light-absorbent liquid immersion angled exposure for patterning 3D samples with vertical sidewalls

Kumagai¹,

Kubo²,

Sasaki³

2017

J. Micromech. Microeng.

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To make photolithography patterns on 3D samples, the angled (inclined) exposure technique has been used so far. However, technological issues have emerged in making photolithography patterns on the surface of trench structures. The surface of the trench structures can be covered with a photoresist film by spray-coating but the photoresist film deposited on the sidewalls and bottom of the trench is generally thin. The thin photoresist film deposited inside the trench has been easily overdosed. Moreover, irregular patterns have frequently been formed by the light reflected inside the trench. In this study, we have developed liquid immersion photolithography using a light-absorbent material. The light-reflection inside the trench was suppressed. Various patterns were transferred in the photoresist film deposited on the trench structures which had an aspect ratio of 0.74. Compared to immersion photolithography using pure water under p-polarization light control, the light-absorbent liquid immersion photolithography developed here patterned well the surfaces of the trench sidewalls and bottom.

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“…[13][14][15][16][17][18] On the other hand, various roller molds for nanoimprint patterning are also developed. [19][20][21][22][23] However, because these roller molds are used for roll-to-roll or roll-to-sheet printing, they have very large diameters and do not match the above-mentioned targets. In addition, from the viewpoint of resist thickness, technological adaptivity is low.…”

Section: Introductionmentioning

confidence: 99%

Synchronous scan-projection lithography on overall circumference of fine pipes with a diameter of 2 mm

Horiuchi¹,

Furuhata²,

Muro³

2016

Jpn. J. Appl. Phys.

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The scan-projection exposure of small-diameter pipe surfaces was investigated using a newly developed prototype exposure system. It is necessary to secure a very large depth of focus for printing thick resist patterns on round pipe surfaces with a roughness larger than that of semiconductor wafers. For this reason, a camera lens with a low numerical aperture of 0.089 was used as a projection lens, and the momentary exposure area was limited by a narrow slit with a width of 800 µm. Thus, patterns on a flat reticle were replicated on a pipe surface by linearly moving the reticle and rotating the pipe synchronously. By using a reticle with inclined line-and-space patterns, helical patterns with a width of 30 µm were successfully replicated on stainless-steel pipes with an outer diameter of 2 mm and coated with a 10-µm-thick negative resist. The patterns replicated at the start and stop edges were smoothly stitched seamlessly.

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3D micro patterning on a concave substrate for creating the replica of a cylindrical PDMS stamp

Cited by 11 publications

References 17 publications

Fabrication of Polymer Microstructures of Various Angles via Synchrotron X-Ray Lithography Using Simple Dimensional Transformation

Fabrication of Polymer Microstructures of Various Angles via Synchrotron X-Ray Lithography Using Simple Dimensional Transformation

Light-absorbent liquid immersion angled exposure for patterning 3D samples with vertical sidewalls

Synchronous scan-projection lithography on overall circumference of fine pipes with a diameter of 2 mm

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