Tin selenide thin films have been grown by molecular beam epitaxy on GaAs (111)B substrates at a growth temperature of 150°C, and a microstructural study has been carried out, primarily using the technique of transmission electron microscopy. The Se:Sn flux ratio during growth was systematically varied and found to have a strong impact on the resultant crystal structure and quality. Low flux ratios (Se:Sn = 3:1) led to defective films consisting primarily of SnSe, whereas high flux ratios (Se:Sn > 10:1) gave higher quality, single-phase SnSe 2. The structure of the monoselenide films was found to be consistent with the Space Group Pnma with the epitaxial growth relationship of [011] SnSe //[ ] GaAs , while the diselenide films were consistent with the Space Group , and had the epitaxial growth relationship [ ] SnSe2 //[ ] GaAs .