Patent Review on Laser Interference Lithography Technique for Producing Periodic Nanostructure

Abstract

Nanostructure is necessary for the existing industrial application, future development of technology or manufacturing of advanced products. Regarding the requirements of industrial technology on large area and pattern refinement, the bottleneck of lithography technique is also the key to development. The mask-less laser interference lithography can produce large area exposure and define periodic nanoscale surface pattern in the spatially periodic manner to effectively lower the cost. This research investigates related US patent documents and the findings of patent review in this research show the structure architecture of this technique has different forms, and the beam splitter architecture has advantages and application potentials on the extensive requirements of complex periodic structure. The current and future development aims at improving the system's precision and stability and improving and expanding the system device to meet the requirements' of market commercialization. We will keep improving the precision of interference lithography to avoid the defocus of high-density line width. It's particularly suitable for the micro nanofluid device in the emerging bionanotechnology to observe fluid behavior at the minimum scale.