EUV polarimetry for thin film and surface characterization and EUV phase retarder reflector development

Abstract

The knowledge and the manipulation of light polarization state in the vacuum ultraviolet and extreme ultraviolet (EUV) spectral regions play a crucial role from materials science analysis to optical component improvements. In this paper, we present an EUV spectroscopic ellipsometer facility for polarimetry in the 90-160 nm spectral range. A single layer aluminum mirror to be used as a quarter wave retarder has been fully characterized by deriving the optical and structural properties from the amplitude component and phase difference δ measurements. The system can be suitable to investigate the properties of thin films and optical coatings and optics in the EUV region.

Experimental Study of Few‐Layer Graphene: Optical Anisotropy and Pseudo‐Brewster Angle Shift in Vacuum Ultraviolet Spectral Range

“…The detailed procedure is described in the study by Gaballah et al [ 38 ] The same apparatus was recently implemented with a rotating polarizer for ellipsometry in VUV–EUV spectral region. [ 18,39 ] The technical data of the system and the method are described in studies by Gaballah et al [ 38,40 ]…”