2017
DOI: 10.1186/s11671-017-2020-1
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Enhanced Corrosion Resistance of PVD-CrN Coatings by ALD Sealing Layers

Abstract: Multilayered hard coatings with a CrN matrix and an Al2O3, TiO2, or nanolaminate-Al2O3/TiO2 sealing layer were designed by a hybrid deposition process combined with physical vapor deposition (PVD) and atomic layer deposition (ALD). The strategy was to utilize ALD thin films as pinhole-free barriers to seal the intrinsic defects to protect the CrN matrix. The influences of the different sealing layers added in the coatings on the microstructure, surface roughness, and corrosion behaviors were investigated. The … Show more

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Cited by 29 publications
(20 citation statements)
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References 22 publications
(28 reference statements)
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“…The name of the author [Zhixin Wan] was not completely displayed in the original publication [ 1 ]. The original article has been updated to rectify this error.…”
Section: Erratummentioning
confidence: 99%
“…The name of the author [Zhixin Wan] was not completely displayed in the original publication [ 1 ]. The original article has been updated to rectify this error.…”
Section: Erratummentioning
confidence: 99%
“…To create electrical circuit elements on textile products, various techniques have been used, such as physical vapor deposition (PVD), chemical vapor deposition (CVD), digital printing method, plasma-assisted physical vapor deposition, polymer-assisted physical vapor deposition (PAPVD), embroidery, etc. [1][2][3][4][5][6]. Another method for producing thin conductive layers on various substrates is the electrospinning technique [7,8].…”
Section: Introductionmentioning
confidence: 99%
“…Tailoring the coatings properties to specific purposes requires understanding of their microstructure, topography and mechanical properties but also the interrelationship between these properties. The coatings topography is important for their tribological and corrosion behavior [1,2], while coating microstructure (grain morphology) governs their mechanical properties, fracture behavior, and their tribological performance [3]. Besides the initial substrate roughness, the coatings topography greatly depends on the kind of applied deposition process, employed parameters, and the type of substrate material.…”
Section: Introductionmentioning
confidence: 99%
“…Magnetron sputtering (MS) is a widely applied industrial deposition process known for the production of high quality, dense coatings with relatively low roughness and residual stresses. However, considering that this process is line-of-sight deposition, micro-and nano-surface morphological features present on the substrate affect the coating growth and cause formation of defects in the coating layer [2]. Growth defects are discontinuities in coating material in form of peaks (nodular defects) and valleys (cavities) [4].…”
Section: Introductionmentioning
confidence: 99%
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