Size-Dependent Filling Behavior of UV-Curable Di(meth)acrylate Resins into Carbon-Coated Anodic Aluminum Oxide Pores of around 20 nm

Nakagawa, Masaru; Nakaya, Akifumi; Hoshikawa, Yasuto; Ito, Shunya; Hiroshiba, Nobuya; Kyotani, Takashi

doi:10.1021/acsami.6b10561

Cited by 13 publications

(17 citation statements)

References 33 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Diacrylate monomers of 1,10-decanediol diacrylate (AC10, A-DOD-N, Shin-Nakamura Chemical), dipropanoic acid (1-methyl-1,2-ethandiyl)bis[oxy(2-hydroxy-1,3-propanediyl)] ester (70PA, Kyoeisha Chemical), and glycerol 1,3-diglycerolate diacrylate (GDD, Sigma-Aldrich) were used as purchased. The viscosities in the bulk state were 10 mPa·s for AC10, 1230 mPa·s for 70PA, and 12 950 mPa·s for GDD . AC10-, 70PA-, and GDD-based resins were prepared by adding the photoinitiator of 2-methyl-1-[4-(methylthio)phenyl]-2-morpholino-1-propanone (Irgacure 907, BASF Japan) with a molar ratio of 1:0.04 to each base monomer.…”

Section: Methodsmentioning

confidence: 99%

“…Chemical structures of (a) AC10, (b) 70PA, (c) GDD, (d) FAS3-Cl, and (e) FAS13. The viscosities in the bulk state were 10 mPa·s for AC10, 1230 mPa·s for 70PA, and 12 950 mPa·s for GDD …”

Section: Introductionmentioning

confidence: 99%

“…The following studies have been demonstrated: − efficient surface modification of mold and substrate surfaces with chemisorbed monolayers, reduction of demolding energies by fluorinated additives in UV-curable resins in repeatable UV nanoimprinting, suppression of mold pollution by selecting base monomers determined by fluorescence microscopy, and 22 nm line resist patterns fabricated by UV nanoimprinting. To investigate the chemical structures of di(meth)acrylate monomers suitable for fabricating smaller patterns, we fabricated carbon-coated anodic aluminum oxide films with approximately 20 nm diameter holes and investigated the filling of UV-curable resins into the holes . The number of imprinted pillar patterns increased with an increase in the number of hydroxy groups of the monomers, and the number of pillars was independent of the viscosity of di(meth)acrylate monomers in the range of 40–12 950 mPa·s.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement

et al. 2018

Self Cite

View full text Add to dashboard Cite

In UV nanoimprinting, the selection of monomers suitable for sub-15 nm patterning is difficult because the filling behavior of resin at this scale still remains scientifically unclear. We demonstrate sub-15 nm patterning by UV nanoimprinting using silica molds with 20, 15, and 7 nm diameter holes; however, the 7 nm diameter pillar patterns were not fabricated using hydroxy-containing monomers. The filling behavior into silica holes of around 10 nm depended on the chemical structure of the monomers. Resonance shear measurements revealed the following: (1) The viscosities of hydroxy-containing monomers confined between chlorodimethyl(3,3,3-trifluoropropyl)silane (FAS3-Cl)-modified surfaces began to increase at distances shorter than those of the monomers between unmodified surfaces. (2) The monomers confined between tridecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane-modified surfaces were squeezed out when the surface-surface distance decreased at less than 7 nm. The measured viscosities between the FAS3-Cl-modified silica surfaces were correlated with the insufficient filling behavior into the silica holes of around 10 nm in UV nanoimprinting. Contact angle measurements provided an additional insight that a higher wettability of the monomers onto the antisticking chemisorbed monolayers resulted in imprinted patterns with higher aspect ratios. Considering the increase in the monomer viscosity in the nanospace and the wettability of monomers onto chemisorbed monolayers, we concluded that the monomer showing low viscosity under confinement and high wettability onto the mold surface was suitable for single-digit nanometer UV nanoimprinting.

show abstract

Section: Methodsmentioning

confidence: 99%

“…Chemical structures of (a) AC10, (b) 70PA, (c) GDD, (d) FAS3-Cl, and (e) FAS13. The viscosities in the bulk state were 10 mPa·s for AC10, 1230 mPa·s for 70PA, and 12 950 mPa·s for GDD …”

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement

et al. 2018

Self Cite

View full text Add to dashboard Cite

show abstract

“…Furthermore, because of the milder molding conditions of SFIL, the shaped layers do not need to undergo large temperature changes for each subsequent layer, as is the case with NIL . Photocurable low‐viscous acrylate‐based precursors and biomaterials can be used as resists. SFIL has also been used in two‐step imprinting processes to replicate complex structures ( Figure ) .…”

Section: Fabrication Methods For 3d Structures With Areas Of Various mentioning

confidence: 99%

Nanostructure and Microstructure Fabrication: From Desired Properties to Suitable Processes

Assenbergh

Meinders²,

Geraedts

et al. 2018

Small

View full text Add to dashboard Cite

When designing a new nanostructure or microstructure, one can follow a processing-based manufacturing pathway, in which the structure properties are defined based on the processing capabilities of the fabrication method at hand. Alternatively, a performance-based pathway can be followed, where the envisioned performance is first defined, and then suitable fabrication methods are sought. To support the latter pathway, fabrication methods are here reviewed based on the geometric and material complexity, resolution, total size, geometric and material diversity, and throughput they can achieve, independently from processing capabilities. Ten groups of fabrication methods are identified and compared in terms of these seven moderators. The highest resolution is obtained with electron beam lithography, with feature sizes below 5 nm. The highest geometric complexity is attained with vat photopolymerization. For high throughput, parallel methods, such as photolithography (≈10 m h ), are needed. This review offers a decision-making tool for identifying which method to use for fabricating a structure with predefined properties.

show abstract

“…Filling of a UV resin into nanostructures in the Si master mainly depends on the material properties of the UV resin used and the interfacial properties between the resin and the nanostructures [12, 13]. The material properties of the resin include the size (or molecular weight) of the monomer chain and the viscosity of the resin solution [4].…”

Section: Resultsmentioning

confidence: 99%

Selection of UV-resins for nanostructured molds for thermal-NIL

2018

View full text Add to dashboard Cite

Nanoimprint molds made of soft polymeric materials have advantages of low demolding force and low fabrication cost over Si or metal-based hard molds. However, such advantages are often sacrificed by their reduced replication fidelity associated with the low mechanical strength. In this paper, we studied replication fidelity of different UV-resin molds copied from a Si master mold via UV nanoimprint lithography (NIL) and their thermal imprinting performance into a thermoplastic polymer. Four different UV-resins were studied: two were high surface energy UV-resins based on tripropyleneglycol diacrylate (TPGDA resin) and polypropyleneglycol diacrylate (PPGDA resin), and the other two were commercially available, low surface energy poly-urethane acrylate (PUA resin) and fluorine-containing (MD 700) UV-resins. The replication fidelity among the four UV-resins during UV nanoimprint lithograph from a Si master with sharp nanostructures was in the increasing order of (poorest) PUA resin < MD 700 < PPGDA resin < TPGDA resin (best). The results show that the high surface energy and small monomer size are keys to achieving good UV-resin filling into sharp nanostructures over the viscosity of the resin solution. When the four UV-resin molds were used for thermal-NIL into a thermoplastic polymer, the replication fidelity was in the increasing order of (poorest) MD 700 < TPGDA resin < PUA resin (best), which follows the same order of their Young's moduli. Our results indicate that the selection of an appropriate UV-resin for NIL molds requires consideration of the replication fidelities in the mold fabrication and the subsequent thermal-NIL into thermoplastic polymers.

show abstract

Size-Dependent Filling Behavior of UV-Curable Di(meth)acrylate Resins into Carbon-Coated Anodic Aluminum Oxide Pores of around 20 nm

Cited by 13 publications

References 33 publications

Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement

Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement

Nanostructure and Microstructure Fabrication: From Desired Properties to Suitable Processes

Selection of UV-resins for nanostructured molds for thermal-NIL

Contact Info

Product

Resources

About