2014
DOI: 10.1088/0957-4484/25/50/504001
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NiO/nanoporous graphene composites with excellent supercapacitive performance produced by atomic layer deposition

Abstract: Nickel oxide (NiO) is a promising electrode material for supercapacitors because of its low cost and high theoretical specific capacitance of 2573 F g(-1). However, the low electronic conductivity and poor cycling stability of NiO limit its practical applications. To overcome these limitations, an efficient atomic layer deposition (ALD) method is demonstrated here for the fabrication of NiO/nanoporous graphene (NG) composites as electrode materials for supercapacitors. ALD allows uniform deposition of NiO nano… Show more

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Cited by 45 publications
(31 citation statements)
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References 38 publications
(58 reference statements)
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“…Excluding the peaks of the carbon substrate, all other diffraction peaks can be well indexed to NiO (JCPDS 65-5745), which match well as previous reports on ALD NiO. 34 XPS survey spectra of the GF-CNT@NiO is presented in Figure 2b-d (the wide range spectra is in Electronic Supplementary Information). The peaks located at 871.5 and 853.0-854.7 eV accompanied by a broad satellite peak correspond to the characteristic Ni 2p 1/2 and Ni 2p 3/2 peaks of Ni 2+ (Figure 2b), 36,37 and the peak of O 1s centered at 530.1 eV and 531.6 eV can be attributed to the metal oxide form (O2 -) and surface -OH group, respectively ( Figure 2c).…”
supporting
confidence: 85%
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“…Excluding the peaks of the carbon substrate, all other diffraction peaks can be well indexed to NiO (JCPDS 65-5745), which match well as previous reports on ALD NiO. 34 XPS survey spectra of the GF-CNT@NiO is presented in Figure 2b-d (the wide range spectra is in Electronic Supplementary Information). The peaks located at 871.5 and 853.0-854.7 eV accompanied by a broad satellite peak correspond to the characteristic Ni 2p 1/2 and Ni 2p 3/2 peaks of Ni 2+ (Figure 2b), 36,37 and the peak of O 1s centered at 530.1 eV and 531.6 eV can be attributed to the metal oxide form (O2 -) and surface -OH group, respectively ( Figure 2c).…”
supporting
confidence: 85%
“…But if the active material of NiO is further increased, the thicker NiO layer can retard the electrochemical reaction at high rate, which can explain the capacity decrease of GF-CNT@900NiO compared with GF-CNT@600NiO. 34,43 In current work, GF-CNT@600NiO shows the optimized capacity. Figure 3c shows the relationship between the capacity of the samples and the charge-discharge current densities.…”
mentioning
confidence: 69%
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“…Chen et al. achieved a uniform deposition of NiO NPs with controlled sizes on graphene through this method, which provided a specific capacitance of 907 F g −1 and 94 % retention after 1500 cycles . Yu et al.…”
Section: Supercapacitors (Scs)mentioning
confidence: 99%