Two-dimensional disorder for broadband, omnidirectional and polarization-insensitive absorption

Burresi, Matteo; Pratesi, F; Vynck, Kevin; Prasciolu, Mauro; Tormen, Massimo; Wiersma, Diederik S.

doi:10.1364/oe.21.00a268

Cited by 53 publications

(55 citation statements)

References 29 publications

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“…A convenient and efficient solution for enhancing light absorption relies on the exploitation of disordered structures 13,[29][30][31][32][33] . The superior AR properties of disordered systems account for the importance of this approach with respect to its ordered counterparts and it has been recently proposed 20 and implemented 19 using dielectric Mie resonators.…”

Section: Introductionmentioning

confidence: 99%

Self-assembled antireflection coatings for light trapping based on SiGe random metasurfaces

Bouabdellaoui

Checcucci

Wood

et al. 2018

Phys. Rev. Materials

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We demonstrate a simple self-assembly method based on solid state dewetting of ultra-thin silicon films and germanium deposition for the fabrication of efficient anti reflection coatings on silicon for light trapping. Via solid state dewetting of ultra-thin silicon on insulator and epitaxial deposition of Ge we fabricate SiGe islands with a high surface density, randomly positioned and broadly varied in size. This allows to reduce the reflectance to low values in a broad spectral range (from 500 nm to 2500 nm) and a broad angle (up to 55 degrees) and to trap within the wafer a large portion of the impinging light (∼40%) also below the band-gap, where the Si substrate is non-absorbing. Theoretical simulations agree with the experimental results showing that the efficient light coupling into the substrate mediated by Mie resonances formed within the SiGe islands. This lithography-free method can be implemented on arbitrarily thick or thin SiO2 layers and its duration only depends on the sample thickness and on the annealing temperature.

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Section: Introductionmentioning

confidence: 99%

Self-assembled antireflection coatings for light trapping based on SiGe random metasurfaces

Bouabdellaoui

Checcucci

Wood

et al. 2018

Phys. Rev. Materials

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“…the optical, mechanical and chemical surface properties. The diversity of adjustable structures and the broad spectrum of available materials could therefore facilitate the realisation of various concepts including broadband, omnidirectional and polarisation-insensitive surface absorption properties [17,18], plasmonics for improved photovoltaic devices [19], the tailoring of surface wettability properties [20], surface topographies for biomedical applications [21] and nanostructure formation for surface colorising [22][23][24]. Despite these versatile and promising applications up to now only a few studies have discussed the utilisation of transient polarisation states during LIPPS-based surface structuring.…”

Section: Introductionmentioning

confidence: 99%

Polarisation-dependent generation of fs-laser induced periodic surface structures

Gräf

Müller

2015

Applied Surface Science

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“…We attribute high broadband absorption enhancement to the comprehensive design of the structural parameters. Simultaneous optimization of wrinkle wavelength, material filling ratio, and feature depth not only enables waveguide coupling but serves as a "natural" antireflection coating as well (37). Although the trends match, the absorption on fabricated samples compared with predications is slightly lower, which is likely attributed to undesired scattering from the surface roughness of features on a-Si (SI Appendix, Fig.…”

Section: Significancementioning

confidence: 97%

Concurrent design of quasi-random photonic nanostructures

Lee

Engel

et al. 2017

Proc. Natl. Acad. Sci. U.S.A.

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Nanostructured surfaces with quasi-random geometries can manipulate light over broadband wavelengths and wide ranges of angles. Optimization and realization of stochastic patterns have typically relied on serial, direct-write fabrication methods combined with real-space design. However, this approach is not suitable for customizable features or scalable nanomanufacturing. Moreover, trial-and-error processing cannot guarantee fabrication feasibility because processing-structure relations are not included in conventional designs. Here, we report wrinkle lithography integrated with concurrent design to produce quasi-random nanostructures in amorphous silicon at wafer scales that achieved over 160% light absorption enhancement from 800 to 1,200 nm. The quasi-periodicity of patterns, materials filling ratio, and feature depths could be independently controlled. We statistically represented the quasi-random patterns by Fourier spectral density functions (SDFs) that could bridge the processing-structure and structure-performance relations. Iterative search of the optimal structure via the SDF representation enabled concurrent design of nanostructures and processing.wrinkles | light trapping | silicon photonics | spectral density function | pattern transfer Q uasi-random structures with neither periodic nor fully disordered geometries are useful in the design of superhydrophobic substrates (1, 2), stretchable electronics (3-6), and sensors (7,8). In particular, these nanostructured systems support rich Fourier spectra that enable light manipulation over broadband wavelengths and over wide collection angles (9, 10). Independent control over the relative degree of order vs. disorder, materials filling ratio, and feature size is critical to generate patterns with a diverse range of optical responses (11). For example, quasi-random nanostructures in photonic materials such as amorphous silicon (a-Si) are being increasingly used in photovoltaics and light-emitting diodes (9, 12-18). To enhance device performance from the patterns, optimization of nanoscale structure is crucial. However, most efforts to control quasirandom patterns have relied on serial processes such as electron-beam lithography (9,12,16,18,19). Although such approaches enable precise pattern placement and maximum control over the nanostructured features, the tools are not scalable and are cost prohibitive for large-area fabrication (>1 cm 2 ). Furthermore, most work has focused on the traditional, sequential strategy for pattern generation: (i) design nanostructures in real space for a target performance and then (ii) fabricate structures by trial-and-error processing optimization (9, 20). Without considering the fabrication conditions as part of the overall design strategy, however, conventional methods cannot ensure manufacturing feasibility of the optimized nanostructures. Trial-and-error experiments to achieve optimal designs are usually time-consuming. Hence, development of a concurrent design approach can establish the phase space of target quasi-rand...

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Two-dimensional disorder for broadband, omnidirectional and polarization-insensitive absorption

Cited by 53 publications

References 29 publications

Self-assembled antireflection coatings for light trapping based on SiGe random metasurfaces

Self-assembled antireflection coatings for light trapping based on SiGe random metasurfaces

Polarisation-dependent generation of fs-laser induced periodic surface structures

Concurrent design of quasi-random photonic nanostructures

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