We show proof of concept of a real-time reconfigurable photomask fabricated from holographically formed polymer-dispersed liquid crystal (H-PDLC) reflection gratings on etched indium tin oxide patterned electrodes. H-PDLC films were formed using a thiolene based polymer to have a reflection wavelength that modulates 440nm, the peak sensitivity wavelength of Shipley 1800 series positive photoresist. A working prototype of this adaptable photomask device is shown by comparing patterns formed using the H-PDLC mask and similar patterns formed using a static contact photomask showing that H-PDLC films have the ability to modulate 440nm light and control the exposure dose of photoresist.