2021
DOI: 10.1590/s1517-707620210004.1311
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Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films

Abstract: Ta 1-x Zr x N thin films were deposited by reactive magnetron sputtering aiming to investigate the influence of zirconium addition on the microstructure, hardness and high temperature oxidation resistance of the coatings. GAXRD showed that all Ta 1-x Zr x N thin films maintained ZrN crystalline structure, forming a TaZrN solid solution. Zr incorporation did not alter hardness values of Ta 1-x Zr x N coatings, however, promoted significant improvements in the oxidation resistance when compared to pure TaN thin … Show more

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“…Therefore, TaN can be established as a promising material for biomedical applications. [270,271] 3.8.1. Surface Properties of TaN Films Nanomechanical properties of the TaN thin films deposited by reactive magnetron sputtering were evaluated with varied N 2 flow ratio.…”
Section: Tanmentioning
confidence: 99%
“…Therefore, TaN can be established as a promising material for biomedical applications. [270,271] 3.8.1. Surface Properties of TaN Films Nanomechanical properties of the TaN thin films deposited by reactive magnetron sputtering were evaluated with varied N 2 flow ratio.…”
Section: Tanmentioning
confidence: 99%