Characterization of thiol-functionalised silica films deposited on electrode surfaces

Abstract

Thiol-functionalised silica films were deposited on various electrode surfaces (gold, platinum, glassy carbon) by spin-coating sol-gel mixtures in the presence of a surfactant template. Film formation occurred by evaporation induced self-assembly (EISA) involving the hydrolysis and (co)condensation of silane and organosilane precursors on the electrode surface. The characterization of such material was performed by IR spectroscopy, thermogravimetry (TG), elemental analysis (EA), atomic force microscopy (AFM), scanning electron microscopy (SEM) and cyclic voltammetry (CV).

Tri-stimuli-responsive biodegradable theranostics for mild hyperthermia enhanced chemotherapy

“…As shown in the Fourier transform infrared (FT-IR) spectra (Figure 2g), CuS@PMOs demonstrate the characteristic bands of C-H bond at 2930/1450/1410 cm −1 , C-S bond at 694 cm −1 , and -SH bond at 580 cm −1 [14,29]. After DOX was loaded into the hollow PMOs through electrostatic interaction, there appeared a new band at 1700 cm −1 , which was assigned to C=O carbonyl stretching of DOX [30].…”

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“…As imagens de AFM da superfície do eletrodo modificado apresentaram características não presentes quando comparadas, às do eletrodo de carbono vítreo não modificado, evidenciando que o filme de sílica tiol-funcionalizado afetou a sua topografia. A imagem no eletrodo modificado revelou que o filme formou-se uniformemente na superfície do eletrodo de carbono vítreo, principalmente quando se compara este mesmo filme na superfície de ouro ou platina103 . Imagens de AFM: a) eletrodo de carbono vítreo e b) eletrodo de carbono vítreo modificado com filme contendo 15% MPTMS.…”