2005
DOI: 10.1590/s1516-14392005000200002
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Structure and properties of selected cemented carbides and cermets covered with TiN/(Ti,Al,Si)N/TiN coatings obtained by the cathodic arc evaporation process

Abstract: This study presents the results of microstructural examinations, mechanical tests and service performance tests carried out on thin TiN/(Ti,Al,Si)N/TiN wear resistance coatings obtained by the CAE process on cermet and cemented carbide substrates. Microstructural examinations of the applied coatings and the substrate were made with an OPTON DSM 940 SEM and a LEICA MEF4A light microscope. Adhesion of the coatings on cemented carbides and cermets was measured using the scratch test. The cutting properties of the… Show more

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Cited by 7 publications
(4 citation statements)
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“…Since no simple monotonic trends exist for the dependence of lattice spacing on nitrogen atomic percentage, no conclusions can be drawn from the XRD spectra on whether the TiN grains are substoichiometric or overstoichiometric even if stoichiometry is the sole contributor to peak shifts. Finally, it should be noted that similar XRD peak shifts have been observed before in polycrystalline TiN thin films. , …”
Section: Resultssupporting
confidence: 85%
See 1 more Smart Citation
“…Since no simple monotonic trends exist for the dependence of lattice spacing on nitrogen atomic percentage, no conclusions can be drawn from the XRD spectra on whether the TiN grains are substoichiometric or overstoichiometric even if stoichiometry is the sole contributor to peak shifts. Finally, it should be noted that similar XRD peak shifts have been observed before in polycrystalline TiN thin films. , …”
Section: Resultssupporting
confidence: 85%
“…Finally, it should be noted that similar XRD peak shifts have been observed before in polycrystalline TiN thin films. 41,42 Among the different plasma parameters, ammonia flow rate and plasma power are found to greatly affect the particle morphology, chemical composition, and optical properties of the TiN NCs. TEM images were collected for TiN samples produced at 100 W nominal plasma power with different ammonia flow rates, shown in Figure 4.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…For example, the deposition of wear resistant coatings onto high speed cutting tools is less suited to CVD because of the low austenitising temperature (450-550 • C) of steel. TiN coatings have been processed by CVD and PVD [7], by methods such as cathodic arc evaporation [8], elec-tron beam deposition [9], plasma [10], etc. Up to our knowledge the TiN films prepared by those techniques hardly reach 3-5 min thickness [3], exhibiting large crystallites sizes, for example 100 nm from films prepared by low voltage-high current PVD, 60 nm from plasma enhanced magnetron PVD, 200 nm from cathodic arc PVD and 500 nm from high temperature CVD [7].…”
Section: Introductionmentioning
confidence: 99%
“…Among techniques to process TiN and TiC coatings, such as physical (PVD) or chemical vapor deposition (CVD) or nitridation of TiO 2 should be highlighted. PVD includes techniques such as cathodic arc evaporation [1], ion beam deposition [2,3], ion implantation [4], plasma [5] and laser methods [6,7]. In those techniques, TiN nanocrystals grow forming typically elongated particles in the range of several hundreds of nanometers and coatings with hardness of approximately 27 GPa are obtained.…”
Section: Introductionmentioning
confidence: 99%