Taxa de crescimento de filmes de diamante CVD em superfícies de molibdênio

Fujiy, Oswaldo Kazushi; Trava-Airoldi, V.J.; Corat, Evaldo José; Ferreira, Marcelo Juni; Amorim, A.; Moro, Juliano

doi:10.1590/s0370-44672007000200004

Cited by 2 publications

(1 citation statement)

References 8 publications

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“…However, in CVD diamond films, there are several aspects that complicate the process, obtaining a suitable adhesion between the film and the substrate is one of the main problems [20]. Factors like: a clean surface; temperature; the chemical nature of the substrate; the nucleation density of the film; the surface roughness of the substrate; and also the thermal stresses (due to the different coefficients of thermal expansion between diamond and the conventional substrates) can greatly influence the film adhesion [21][22][23].…”

Section: Coatings 2018 8 X For Peer Review 2 Of 13mentioning

confidence: 99%

HFCVD Diamond-Coated Mechanical Seals

et al. 2018

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A mechanical seal promotes the connection between systems or mechanisms, preventing the escape of fluids to the exterior. Nonetheless, due to extreme working conditions, premature failure can occur. Diamond, due to its excellent properties, is heralded as an excellent choice to cover the surface of these devices and extend their lifetime. Therefore, the main objective of this work was to deposit diamond films over mechanical seals and test the coated seals on a water pump, under real working conditions. The coatings were created by hot filament chemical vapor deposition (HFCVD) and two consecutive layers of micro-and nanocrystalline diamond were deposited. One of the main difficulties is the attainment of a good adhesion between the diamond films and the mechanical seal material (WC-Co). Nucleation, deposition conditions, and pre-treatments were studied to enhance the coating. Superficial wear or delamination of the film was investigated using SEM and Raman characterization techniques, in order to draw conclusions about the feasibility of these coatings in the WC-Co mechanical seals with the purpose of increasing their performance and life time. The results obtained gave a good indication about the feasibility of this process and the deposition conditions used, with the mechanical seals showing no wear and no film delamination after a real work environment test.

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Section: Coatings 2018 8 X For Peer Review 2 Of 13mentioning

confidence: 99%

HFCVD Diamond-Coated Mechanical Seals

et al. 2018

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Crescimento de diamante CVD em substratos de silício de grande área

Moro

Trava-Airoldi²,

Corat³

et al. 2010

Rem: Rev. Esc. Minas

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ResumoRealizaram-se crescimentos de fi lmes de diamante por deposição química de vapor (CVD, do inglês Chemical Vapor Deposition) em substratos de silício (100), de grande área (80 cm²), em um reator de fi lamento quente (HFCVD), com taxas de crescimento superiores a 1,5 μm/h. Foi realizado o crescimento das amostras com diferentes fl uxos gasosos e diferentes porcentagens de metano (CH 4 ) em hidrogênio (H 2 ). As amostras foram caracterizadas por microscopia óptica, eletrônica de varredura e por espectroscopia de espalhamento Raman. Tais análises acusaram a presença de diamante de alta pureza em todas as amostras. Palavras-chave:

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Taxa de crescimento de filmes de diamante CVD em superfícies de molibdênio

Abstract: Abstract

Cited by 2 publications

References 8 publications

HFCVD Diamond-Coated Mechanical Seals

HFCVD Diamond-Coated Mechanical Seals

Crescimento de diamante CVD em substratos de silício de grande área

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