2006
DOI: 10.1590/s0103-97332006000600067
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Phase identification and AES depth profile analysis of Cu(In,Ga)Se2 thin films

Abstract: This work presents results related with phase identification and study of the homogeneity in the chemical composition of Cu(In,Ga)Se 2 (CIGS) thin films grown by a chemical reaction of the precursor species evaporated sequentially on a soda-lime glass substrate, in a two or three-stage process. For that, the CIGS samples were characterized through X-ray diffraction (XRD) and Auger Electron Spectroscopy (AES) depth profile measurements, respectively. The presence of secondary phases growing superficially was id… Show more

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Cited by 5 publications
(2 citation statements)
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“…processes where the In and Ga are evaporated first and the Cu is turned on and off at different while the substrate temperature is ( Figure 1) has become especially widely used, since it has been shown to lead to enhanced efficiency in laboratory samples [3]. However, a stage process may introduce gradations into a film and ay require multiple diffusion processes to achieve a uniform…”
Section: Methodsmentioning
confidence: 99%
“…processes where the In and Ga are evaporated first and the Cu is turned on and off at different while the substrate temperature is ( Figure 1) has become especially widely used, since it has been shown to lead to enhanced efficiency in laboratory samples [3]. However, a stage process may introduce gradations into a film and ay require multiple diffusion processes to achieve a uniform…”
Section: Methodsmentioning
confidence: 99%
“…This achievement may allow the fabrication of CIGS this is more suitable to be used in pilot production lines for large area PV modules. 11 Nevertheless, the implementation of this technique still poses an array of challenges in terms of satisfying the requirements of low cost and high "throughput" for commercialization of CIGS modules. For instance, PVD techniques require high vacuum and thermal requirements making them expensive and inhibit scalability.…”
Section: Introductionmentioning
confidence: 99%