Laser production of highly charged ions

Láska, L.; Badziak, J.; Boody, F.P.; Gammino, S.; Jungwirth, K.; Krása, J.; Pfeifer, M.; Rohlena, K.; Ullschmied, J.; Parys, P.; Wołowski, J.; Woryna, E.; Torrisi, L.

doi:10.1590/s0103-97332004000800020

Cited by 13 publications

(9 citation statements)

References 17 publications

(25 reference statements)

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“…Changing the bias voltage V it is possible to change the E/z ratio and to have information about the ion energy distributions. For example Boltzmann ion distributions emitted from hot plasma were detected according to previous papers [7,8]. An example of magnetic deflector is represented by the system used in our laboratory to separate the different mass-to-charge ratio using the horizontal ion deflection produced by a magnetic field of the order of 0.3 T with a length of 1 cm orthogonal to the input direction of ions accelerated from the laser generated plasma.…”

Section: Methodsmentioning

confidence: 99%

Magnetic and electric deflector spectrometers for ion emission analysis from laser generated plasma

Torrisi

Costa

Ceccio

et al. 2018

EPJ Web of Conferences

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Abstract. The pulsed laser-generated plasma in vacuum and at low and high intensities can be characterized using different physical diagnostics. The charge particles emission can be characterized using magnetic, electric and magnet-electrical spectrometers. Such on-line techniques are often based on time-of-flight (TOF) measurements. A 90° electric deflection system is employed as ion energy analyzer (IEA) acting as a filter of the mass-to-charge ratio of emitted ions towards a secondary electron multiplier. It determines the ion energy and charge state distributions. The measure of the ion and electron currents as a function of the mass-to-charge ratio can be also determined by a magnetic deflector spectrometer, using a magnetic field of the order of 0.35 T, orthogonal to the ion incident direction, and an array of little ion collectors (IC) at different angles. A Thomson parabola spectrometer, employing gaf-chromix as detector, permits to be employed for ion mass, energy and charge state recognition. Mass quadrupole spectrometry, based on radiofrequency electric field oscillations, can be employed to characterize the plasma ion emission. Measurements performed on plasma produced by different lasers, irradiation conditions and targets are presented and discussed. Complementary measurements, based on mass and optical spectroscopy, semiconductor detectors, fast CCD camera and Langmuir probes are also employed for the full plasma characterization. Simulation programs, such as SRIM, SREM, and COMSOL are employed for the charge particle recognition.

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Section: Methodsmentioning

confidence: 99%

Magnetic and electric deflector spectrometers for ion emission analysis from laser generated plasma

Torrisi

Costa

Ceccio

et al. 2018

EPJ Web of Conferences

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“…The plasma volumes are generally of the order of tens of cubic millimeters. It was observed that at laser power density of the order of 10 16 W/cm 2 high charge state, up to about 50+ in heavy elements, and high ion kinetic energy, of the order of 0.1 MeV/amu, can be easily obtained [3]. At lower laser pulse intensity, of the order of 10 10 W/cm 2 , the ion charge state and energy decrease to about 10+ and 10 keV, respectively [4].…”

Section: Introductionmentioning

confidence: 99%

Evaluations of electric field in laser-generated pulsed plasma

et al. 2006

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Evaluations of the electric field developed in non-equilibrium laser-generated plasma were obtained from laser ablation experiments at INFN-LNS of Catania and PALS of Prague at the regime of 10 10 W/cm 2 and 10 16 W/cm 2 intensity, respectively. Evaluations are based on the measurements of ion energy distributions from Ta plasma in vacuum obtained through an electrostatic ion energy analyser (IEA) used in both laboratories. IEA gives the energy-to-charge ratio from ion detection with time-of-flight technique. Ion energy distributions can be fitted by Coulomb-Boltzmann-shifted function which depends on the equivalent plasma temperature, plasma expansion process and Coulomb interactions. The energetic shift of the experimental distributions increases with the charge state, indicating that an equivalent voltage able to accelerate ions is developed inside the plasma. Assuming near Local Thermal Equilibrium (LTE) conditions, the voltage can be supposed developed on distances comparable with the Debye legth. Thus, from evaluations and measurements of the plasma temperature and density, it was possible to calculate the shielding length in the plasma and consequently the electrical field. Results indicate that high electric fields, of the order of tens of MV/cm or higher, can be produced inside the laser-generated plasma in the two regimes of laser intensity.

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“…At a laser power density of the order of 10 15 W/cm 2 , the plasma temperature reaches values higher than 10 keV and the plasma density values of the order of 10 19 /cm 3 [1,2]. Plasma produces ions at high charge state and, thank to high electrical fields generated by the non-equilibrium charge condition, accelerates ions at high kinetic energy, * proportionally to the ion charge.…”

Section: Introductionmentioning

confidence: 99%

“…Plasma produces ions at high charge state and, thank to high electrical fields generated by the non-equilibrium charge condition, accelerates ions at high kinetic energy, * proportionally to the ion charge. At PALS laboratory of Prague, charge states higher than 50+ were obtained in heavy elements and ion energy/charge state ratios up to about 50 keV/charge state were measured [3][4][5]. Interesting information on the ion energy can be given by time-offlight (TOF) measurements of ions performed by using high-sensitivity detectors.…”

Section: Introductionmentioning

confidence: 99%

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RBS analysis of ions implanted in light substrates exposed to hot plasmas laser-generated at PALS

Torrisi

Gammino

Picciotto

et al. 2005

Radiation Effects and Defects in Solids

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Ge and Ta ion implantation of silicon and carbon substrates has been obtained at PALS Research Laboratory in Prague by using laser pulses of 400 ps duration, 438 nm wavelength, 10 14-16 W/cm 2 intensity. Substrates were exposed in vacuum at different distances from the target and at different angles with respect to the normal to the target surface. 'On line' measurements of ion energy were obtained with time-of-flight techniques by using an electrostatic deflector as ion energy analyzer. 'Off line' measurements of ion energy were obtained by Rutherford backscattering spectrometry (RBS) of 2.25 MeV He 2+ beam at CEDAD Laboratory of Lecce University. The RBS spectra have given the depth profiles of the ion-implanted species and the implanted doses as a function of the laser intensity, angular position and target distance. A spectra deconvolution method based on the ion stopping power in the substrate matrix was applied in order to evidence the energy of the implanted ions. Measurements indicate that ions with energy ranging between 100 keV and 10 MeV and dose of the order of 10 14−16 /cm 2 are implanted and that the process of ion implantation occurs mainly in substrates placed at little angles with respect to the normal to the target surface. Only a thin film deposition occurs for substrates placed at large angles with respect to the normal direction. Results indicate that the ion energies measured with the 'on line' and the 'off line' techniques are in good agreement.

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Laser production of highly charged ions

Cited by 13 publications

References 17 publications

Magnetic and electric deflector spectrometers for ion emission analysis from laser generated plasma

Magnetic and electric deflector spectrometers for ion emission analysis from laser generated plasma

Evaluations of electric field in laser-generated pulsed plasma

RBS analysis of ions implanted in light substrates exposed to hot plasmas laser-generated at PALS

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