2004
DOI: 10.1590/s0103-50532004000200026
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Hot-filament metal oxide deposition (HFMOD): a novel method for depositing thin films of metallic oxides

Abstract: O presente artigo descreve um novo método para a síntese de filmes finos de óxidos metálicos. Um filamento de metal, que pode ser aquecido por uma fonte de corrente alternada é instalado numa câmara de vácuo. Por meio de um fluxômetro de massa, oxigênio pode ser admitido no interior da câmara. Da reação entre o oxigênio e o metal do filamento aquecido, espécies de óxidos voláteis Me x O y , onde Me é o metal, são formadas, se condensando num substrato colocado próximo ao filamento, formando o filme. Foi observ… Show more

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Cited by 20 publications
(13 citation statements)
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“…Obviously, the 4f profile can be fit by two Gaussian peaks centered at 37.9 and 35.8 eV, which are corresponding to the W 4f 5/2 and W 4f 7/2 orbital of tungsten in the W +6 valence state. 30 Similar spectra is revealed in Fig. 1(d), indicating that both WO 3 layers are stoichiometric WO 3 , in contrary to sub-stoichiometric WO x evaporated in vacuum.…”
Section: Resultssupporting
confidence: 77%
“…Obviously, the 4f profile can be fit by two Gaussian peaks centered at 37.9 and 35.8 eV, which are corresponding to the W 4f 5/2 and W 4f 7/2 orbital of tungsten in the W +6 valence state. 30 Similar spectra is revealed in Fig. 1(d), indicating that both WO 3 layers are stoichiometric WO 3 , in contrary to sub-stoichiometric WO x evaporated in vacuum.…”
Section: Resultssupporting
confidence: 77%
“…Mo3d spectra are fitted to two doublets, with energies for Mo3d 5/2 at ∼233 eV -(the Higher Binding Energy component) HBE in Table 1 and at ∼232 eV -(the Lower Binding Energy component) LBE in Table 1. The 233 eV value can be assigned to the Mo (6+) oxidation state and that at 232 eV, to Mo (5+) [52][53][54]. The value of the binding energy (233.0 eV for Mo3d 5/2 ) of pure MoO 3 is in good agreement with the literature data [52,53].…”
Section: Xps Analysissupporting
confidence: 87%
“…Films are formed by the HFMOD process from VO x gaseous species generated at the filament surface due to thermal reactions between vanadium and oxygen. Description and details of the HFMOD technique are found in literature [7]. The filament temperature, measured during the deposition by an optical pyrometer through a quartz viewport in the chamber wall, ranged from 1365 to 1385 ºC.…”
Section: Methodsmentioning
confidence: 99%
“…The HFMOD is a very simple and inexpensive technique to deposit metal oxide films by heating metal wires of high fusion temperatures, as the transitions metals, in oxygen atmosphere [7]. Thin films of W [8,9,10], Mo [11,12] and V [10] oxides have been produced by this technique, where the electrochromic effect was observed for the W and Mo oxide films [10,12].…”
Section: Introductionmentioning
confidence: 99%