Development of Thin Films Formed by Ti-Zr Alloys at Different Frequencies by the HiPIMS Technique

Abstract

In this work, thin films based on the Ti-Zr system were studied, deposited on a silicon substrate by the magnetron sputtering technique using simultaneously a combination of High-Power Impulse Magnetron Sputtering (HiPIMS) and Direct Current Magnetron Sputtering (DCMS) sources. The objective of this work is analyzing the effect of varying HiPIMS frequency (300 Hz, 400 Hz, 500 Hz, and 600 Hz) on the characteristics and properties of the thin films. The thickness increased between 300 Hz and 500 Hz, where the thickness measured 563 nm and 732 nm, respectively; then it decreased to 709 nm at 600 Hz. Hardness and elastic moduli also tended to decrease with increasing frequency, and the results for the first property were between 7 GPa and 10.3 Gpa, while the elastic moduli were from 114 Gpa to 157 Gpa, in which lower values were reached at higher frequencies. In the wettability test, lower contact angles were observed for samples with lower frequencies due to their high surface energy, providing better hydrophilic properties.