2020
DOI: 10.1590/1980-5373-mr-2019-0536
|View full text |Cite
|
Sign up to set email alerts
|

Cost-Effective Thin n-type Silicon Solar Cells with Rear Emitter

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
4
0
1

Year Published

2020
2020
2022
2022

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 9 publications
(5 citation statements)
references
References 26 publications
0
4
0
1
Order By: Relevance
“…Doping of bulk silicon is the most popular method to fabricate a p–n junction and is achieved by high‐temperature diffusion or ion implant technology to form p + (boron) or n + (phosphorous) regions near surface of the wafer. [ 116 ] Thin amorphous silicon films are doped by plasma enhanced chemical vapor deposition combined with toxic boron/phosphorous gas precursors. [ 117 ] Together these steps have a negative impact on the final performance/cost ratio of the cells.…”
Section: Carbon Nanotubes In Silicon Photovoltaicsmentioning
confidence: 99%
“…Doping of bulk silicon is the most popular method to fabricate a p–n junction and is achieved by high‐temperature diffusion or ion implant technology to form p + (boron) or n + (phosphorous) regions near surface of the wafer. [ 116 ] Thin amorphous silicon films are doped by plasma enhanced chemical vapor deposition combined with toxic boron/phosphorous gas precursors. [ 117 ] Together these steps have a negative impact on the final performance/cost ratio of the cells.…”
Section: Carbon Nanotubes In Silicon Photovoltaicsmentioning
confidence: 99%
“…the axial junction). It can be observed that the value of PCE has dropped (solid red line) compared to the core–shell junction and has its maximum value of 16.5% at = 250 nm, to the standard thickness of the axial shell 65 . When is larger than 1000 nm, the n-doped layer becomes more effective and hence the lifetime was significantly reduced.…”
Section: Resultsmentioning
confidence: 99%
“…Therefore, the thick TiO 2 films provided better surface passivation. To compare the surface passivation, similar solar cells with a thermally grown SiO 2 and TiO 2 ARC achieved an IQE of around 80% at 400 nm, with one extra thermal step to obtain the SiO 2 layer 29 .…”
Section: Resultsmentioning
confidence: 99%