Propriedades de filmes finos de ZnO:Al depositados sobre substratos de poliimida à temperatura ambiente para aplicações em dispositivos optoeletrônicos flexíveis
Abstract:Materiais, Instituto Militar de Engenharia, Pr. General Tibúrcio, 80, Rio de Janeiro, RJ, Brasil 22290-270 leilacruz@ime.eb.br*, breno.felipe.lopes@outlook.com, digfisic@gmail.com, renanmeloclima@gmail.com, cferreira@ime.eb
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