Thermal stability of mercaptan terminated self-assembled multilayer films on SiO2 surfaces

We demonstrate the use of UV-exposed molecular nanolayers ͑MNLs͒ of 3-mercaptan-propyl-trimethoxysilane to inhibit copper-transport across Cu-SiO 2 interfaces more efficiently than the pristine MNLs. Bias-thermal-annealing tests of Cu/ MNL/ SiO 2 /Si͑001͒ /Al capacitors, with MNLs exposed to 254 nm UV radiation, exhibit enhanced barrier properties to Cu diffusion, when compared with capacitors with MNLs not exposed to UV light. X-ray photoelectron spectroscopy reveals that UV exposure converts the mercaptan termini to sulfonates, which are more effective in inhibiting Cu diffusion. Our findings are of importance for tailoring the chemical and mechanical integrity of interfaces for use in applications such as nanodevice wiring and molecular electronics.

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“…10 tan species to sulfonate moieties. 18 We do not observe any significant change for 0 ഛ t exp ഛ 20 min. 3͑b͔͒.…”

mentioning

confidence: 58%

Ultraviolet-oxidized mercaptan-terminated organosilane nanolayers as diffusion barriers at Cu-silica interfaces

Gandhi

Tisch

Singh

et al. 2007

Applied Physics Letters

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“…However, the content of –NH 2 of the surface AMC‐CS/heparin is 17.95%, which is significantly lower than that of AMC‐CS surface (28.67%). Furthermore, two different species were observed on the S2p spectra [Figure (D)], the peaks at 164 eV and at 168 eV should reflect the presence of disulfide sulfur (–S–S–) and oxidized sulfur (SO x H), respectively . Notably, 79.9% of S2p of AMC surface is in the form of –S–S– linkage, which is contributed from the cystamine, and this number decreased to 23.73% and transformed into 76.27% of –SO x H after coating with chitosan and heparin.…”

Section: Resultsmentioning

confidence: 99%

Chemically crosslinked alginate porous microcarriers modified with bioactive molecule for expansion of human hepatocellular carcinoma cells

Zhao

et al. 2014

J Biomed Mater Res

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Microcarrier is an essential matrix for the large-scale culture of anchorage-dependent cells. In this study, chemical cross-linked alginate porous microcarriers (AMC) were prepared using microemulsion and freeze-drying technology. Moreover, chitosan was coated on the surface of microcarriers (AMC-CS) via electrostatic interactions to improve the mechanical strength. The size of AMC can be modulated through adjusting the concentration of alginate, amount of dispersant and stirring rate. The surface chemical characteristics and morphology of AMC-CS were evaluated by Fourier transformed infrared, X-ray photoelectron spectroscopy, and scanning electron microscope. Fibronectin (Fn) or heparin/basic fibroblast growth factor (bFGF) was then immobilized on the surface of microcarriers via layer-by-layer technology to improve the cytocompatibility. Our data suggested that the size of AMC can be accurately modulated from 90 μm to 900 μm with a narrow size distribution. Micropore structures of AMC-CS were relatively disordered and the pore size ranged between 20 μm and 100 μm. Using AMC after modified with Fn or bFGF as the cell expansion microcarriers, we showed that the proliferation rates of HepG2 cells increased significantly, reaching to more than 30-fold of cell expansion after 10 days of culture, with minor cellular damage caused by the microcarriers. Moreover, the AMC microcarriers modified with Fn or bFGF can increase albumin secretion of HepG2. We suggest that our new modified AMC-based microcarriers will be an attractive candidate for the large-scale cell culture of therapeutic cells.

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“…The experimental conditions for copper CVD were; deposition at substrate temperatures of 290∼350°C, reactor working pressure of 3 Torr, and hydrogen flow rate of 20 sccm. According to the literature [22], the thermal stability of mercaptan monolayer film is good at these deposition temperatures. After deposition, the reactor and samples were cooled to room temperature under vacuum and the substrates were removed for subsequent analysis.…”

Section: Preparation Of Substrate Si(100)mentioning

confidence: 80%

Characterization of Chemical Vapor Deposited Copper Films on Mercaptan Self-Assembled Monolayer Diffusion Barriers

Liu

Wang

2006

Chem. Vap. Deposition

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Copper thin films are produced by CVD using the precursor Cu II bis-hexafluoroacetylacetonate [Cu II (hfac) 2 ], on the self-assembled monolayers of a 3-mercaptopropyltrimethoxysilane (MPTMS) modified substrate. The microstructures of the deposited copper films are characterized by various surface analysis techniques, such as scanning electron microscopy (SEM), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The film resistivity was also measured using the fourprobe method. The results of the measurements indicate that the microstructures of copper thin film are strongly dependent on the substrate temperature during film deposition. The copper thin films deposited have a resistivity as low as 2.1 lX cm in the temperature range 290-350°C. These results indicate that the CVD of copper film on a mercaptan SAM diffusion barrier is a potential technique for copper multilevel metallization.

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Thermal stability of mercaptan terminated self-assembled multilayer films on SiO2 surfaces

Cited by 29 publications

References 37 publications

Ultraviolet-oxidized mercaptan-terminated organosilane nanolayers as diffusion barriers at Cu-silica interfaces

Ultraviolet-oxidized mercaptan-terminated organosilane nanolayers as diffusion barriers at Cu-silica interfaces

Chemically crosslinked alginate porous microcarriers modified with bioactive molecule for expansion of human hepatocellular carcinoma cells

Characterization of Chemical Vapor Deposited Copper Films on Mercaptan Self-Assembled Monolayer Diffusion Barriers

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