A detailed study on the influence of an InGaN interlayer between the GaN buffer and InN epilayer on the microstructural properties of the InN layer is reported. Using high‐resolution X‐ray diffraction measurements the mosaicity of MOVPE grown InN epilayers deposited directly on c‐plane sapphire, on GaN buffer layers, and on different InGaN interlayers have been compared. Generally the angle of tilt and hence the screw dislocation density in the InN epilayers can be controlled by growth conditions, while the angle of twist, corresponding to the edge dislocation density is usually weakly dependent on growth conditions. However, for a given layer thickness the edge dislocation density can be significantly reduced by the insertion of an InGaN interlayer.