2020
DOI: 10.1063/5.0019967
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{001}-textured Pb(Zr, Ti)O3 thin films on stainless steel by pulsed laser deposition

Abstract: In this work, we report nearly single oriented {001}-textured ferroelectric PbZr0.52Ti0.48O3 thin films grown by pulsed laser deposition onto AISI 304 stainless steel substrates. Pt, Al2O3, and LaNiO3 buffer layers promote the PbZr0.52Ti0.48O3 {001} texture and protect the substrate against oxidation during deposition. The dominant {001} texture of the PbZr0.52Ti0.48O3 layer was confirmed using x-ray and electron backscatter diffraction. Before poling, the films exhibit a permittivity of about 350 at 1 kHz and… Show more

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Cited by 13 publications
(5 citation statements)
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“…Initial measurements revealed a large leakage current. It was hypothesized that the origin of this leakage current was related to oxygen vacancies, as is often the case in perovskite thin films, 25,30,37 and has already been discussed as a possible origin to the peak shifts observed in the XRD scans. To validate this hypothesis, a series of heat treatments under varying oxygen pressures from 10 to 350 mbar was carried out on NaNbO 3 thin films grown on SrTiO 3 (001) under the same conditions.…”
Section: Resultsmentioning
confidence: 92%
“…Initial measurements revealed a large leakage current. It was hypothesized that the origin of this leakage current was related to oxygen vacancies, as is often the case in perovskite thin films, 25,30,37 and has already been discussed as a possible origin to the peak shifts observed in the XRD scans. To validate this hypothesis, a series of heat treatments under varying oxygen pressures from 10 to 350 mbar was carried out on NaNbO 3 thin films grown on SrTiO 3 (001) under the same conditions.…”
Section: Resultsmentioning
confidence: 92%
“…Self-oriented LNO thin films have been fabricated by methods such as pulsed laser deposition (PLD), 24), 25) sputtering, 26)-28) and chemical solution deposition (CSD). 29)-36) Among them, sputtering has a relatively wide process window for preparation of self-oriented LNO thin films.…”
Section: Introductionmentioning
confidence: 99%
“…These factors contribute to the development of numerous imperfections and pose challenges for the crystalline expansion and dielectric properties of thin coatings [ 61 ]. Hence, considering the practical requirements of industrial applications, it appears highly advisable to develop technology for growing efficient thin ferroelectric films on metallic substrates [ 61 , 62 ].…”
Section: Introductionmentioning
confidence: 99%