2021
DOI: 10.1111/jace.18031
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(001)‐oriented BiFeO3 films integrated on Si with enhanced electrical performances

Abstract: Highly (001)‐oriented pure‐phase BFO films were prepared on traditional Si substrates via radio frequency magnetron sputtering (RFMS). The crystallinity of the films is found to be increased, that is, higher degree of (001) texture, larger grain size, less grain boundary, denser surface morphology, and better thickness uniformity, with increased film thickness. These factors have significant influences on the electrical properties of BFO films, that is, dielectric response, as well as ferroelectric polarizatio… Show more

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Cited by 5 publications
(3 citation statements)
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“…Comparison of ferroelectric properties of pure-phase BiFeO 3 films with reported achievable large polarizations: (a) films obtained by the sol–gel method (green ■: epitaxial and textured films; red ● and magenta ●: polycrystalline films from the literature , and evaluated in this study, respectively); (b) films fabricated by physical deposition methods (green ■, dark green ■, and light green ■: epitaxial and textured films by PLD, rf magnetron sputtering, and MBE methods; red ●: polycrystalline films ).…”
Section: Resultsmentioning
confidence: 99%
“…Comparison of ferroelectric properties of pure-phase BiFeO 3 films with reported achievable large polarizations: (a) films obtained by the sol–gel method (green ■: epitaxial and textured films; red ● and magenta ●: polycrystalline films from the literature , and evaluated in this study, respectively); (b) films fabricated by physical deposition methods (green ■, dark green ■, and light green ■: epitaxial and textured films by PLD, rf magnetron sputtering, and MBE methods; red ●: polycrystalline films ).…”
Section: Resultsmentioning
confidence: 99%
“…Therefore, we fabricated these two entirely different types of BEs and investigated their effects on the crystalline structure and electrical performance of KNN films synthesized by different routes. The deposition of LNO and Pt/Ti electrodes on Si substrates was accomplished through radio-frequency magnetron sputtering, and the process parameters can be found elsewhere. , …”
Section: Methodsmentioning
confidence: 99%
“…The deposition of LNO and Pt/Ti electrodes on Si substrates was accomplished through radio-frequency magnetron sputtering, and the process parameters can be found elsewhere. 17,18 The crystalline phase of the KNN films were analyzed using X-ray diffraction (XRD) with a Bruker D8 Advance instrument from Germany. The XRD analysis was performed using Cu−Kα radiation with a wavelength of 0.15418 nm.…”
Section: Methodsmentioning
confidence: 99%