Solid state UV emitters have many advantages over conventional UV sources. The (Al,In,Ga)N material system is best suited to produce LEDs and laser diodes from 400 nm down to 210 nm—due to its large and tuneable direct band gap, n- and p-doping capability up to the largest bandgap material AlN and a growth and fabrication technology compatible with the current visible InGaN-based LED production. However AlGaN based UV-emitters still suffer from numerous challenges compared to their visible counterparts that become most obvious by consideration of their light output power, operation voltage and long term stability. Most of these challenges are related to the large bandgap of the materials. However, the development since the first realization of UV electroluminescence in the 1970s shows that an improvement in understanding and technology allows the performance of UV emitters to be pushed far beyond the current state. One example is the very recent realization of edge emitting laser diodes emitting in the UVC at 271.8 nm and in the UVB spectral range at 298 nm. This roadmap summarizes the current state of the art for the most important aspects of UV emitters, their challenges and provides an outlook for future developments.

We increased the light-extraction efficiency (LEE) of AlGaN-based deep-ultraviolet light-emitting diodes (DUV LEDs) by introducing a highly reflective photonic crystal (HR-PhC) into the surface of the p-AlGaN contact layer, thereby achieving a high external quantum efficiency (EQE). A low-damage HR-PhC with a lattice period of approximately 250 nm was fabricated using nanoimprinting and dry etching. A reflective Ni/Mg p-type electrode was deposited on the HR-PhC layer using a tilted-evaporation method. The EQE of a conventional DUV LED with emission around 283 nm was increased from 4.8 to 10% by introducing the HR-PhC and the reflective Ni/Mg electrode. A simple estimation of the effective reflectance of the HR-PhC p-AlGaN contact layer with the Ni/Mg electrode indicated a value exceeding 90%.

AlGaN-based ultraviolet-B (UVB) LEDs at 310 nm emissions are expected to offer safe and smart size UVB-light sources compared to the toxic mercury UV-lamp. Previously, the issue of nonlinearity in the emitted light output power (L) as well as in the external quantum efficiency (EQE) of 310 nm band UVB LEDs were observed. First, the influence of both the number of n-AlGaN buffer layers (BLs) and the type of p-electrodes on the recovery of linear behavior in the L and EQE were investigated. It was found that the nonlinearity in the L and EQE of UVB LED is independent of the number of BLs as well as type of p-electrodes. Therefore, finally the dependence of nonlinearity in the L and EQE on the thickness of quantum-well-barrier (T QWB) of multi-quantum-wells (MQWs) were also considered. Subsequently, the issue of nonlinear behavior in the L and EQE was resolved by the thickness reduction of T QWB from 25 to 10 nm in the MQWs. Similarly, a reasonable value of improvement in both L and EQE, respectively, up to 12 mW and 2.2% of 310nm band UVB LED were realized.