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A high-index topological insulator thin film, Bi2 Se3 (221), is grown on a faceted InP(001) substrate by molecular-beam epitaxy (see model in figure (a)). Angle-resolved photoemission spectroscopy measurement reveals the Dirac cone structure of the surface states on such a surface (figure (b)). The Fermi surface is elliptical (figure (c)), suggesting an anisotropy along different crystallographic directions. Transport studies also reveal a strong anisotropy in Hall conductance.

We report the growth of single-domain epitaxial Bi2Se3 films on InP(111)A substrate by molecular-beam epitaxy. Nucleation of Bi2Se3 proceeds at steps, so the lattices of the substrate play the guiding role for a unidirectional crystalline film in the step-flow growth mode. There exists a strong chemical interaction between atoms at the heterointerface, so the growth does not follow the van der Waals epitaxy process. A mounded morphology of thick Bi2Se3 epilayers suggests a growth kinetics dictated by the Ehrlich-Schwoebel barrier. The Schubnikov de Haas oscillations observed in magnetoresistance measurements are attributed to Landau quantization of the bulk states of electrons.

Abstract. High-index Bi2Se3(221) film has been grown on In2Se3-buffered GaAs(001), in which a much retarded strain relaxation dynamics is recorded. The slow strain-relaxation process of in epitaxial Bi2Se3 (221)

This paper presents an overview of growth of Bi 2 Se 3 , a prototypical three-dimensional topological insulator, by molecular-beam epitaxy on various substrates. Comparison is made between growths of Bi 2 Se 3 (111) on van der Waals (vdW) and non-vdW types of substrates, with the attention paid on twin suppression and strain. Growth along the [221] direction of Bi 2 Se 3 on InP(001) and GaAs(001) substrates is also discussed.