Perpendicular CoFeB/MgO/CoFeB magnetic tunnel junctions with diameters under 100 nm are investigated by conductive atomic force microscopy. Minor loops of the tunnel magnetoresistance as a function of applied magnetic field reveal the hysteresis of the soft layer and an offset due to the magnetostatic field of the hard layer. Within the hysteretic region, telegraph noise is observed in the tunnel current. Simulations show that in this range, the net magnetic field in the soft layer is spatially inhomogeneous, and that antiparallel to parallel switching tends to start near the edge, while parallel to antiparallel reversal favors nucleation in the interior of the soft layer. As the diameter of the tunnel junction is decreased, the average magnitude of the magnetostatic field increases, but the spatial inhomogeneity across the soft layer is reduced.
Variable-temperature scanning tunneling spectroscopy revealed a sharp Verwey transition in individual ∼10 nm magnetite nanocrystals prepared by the coprecipitation technique and embedded in the surface of a gold film. The transition was observed as a significant change in the electronic structure around the Fermi level, with an apparent band gap of ∼140-250 meV appearing below the transition temperature and a pseudogap of ∼75 ± 10 meV appearing above it. The transition temperature was invariably observed around 101 ± 2 K for different nanocrystals, as opposed to 123 K typically reported for stoichiometric bulk crystals. This suggests that the lowering of the transition temperature is an intrinsic finite size effect, probably due to the presence of the surface.
Magnetic tunnel junctions with perpendicular magnetic anisotropy are investigated using a conductive atomic force microscope. The 1.23 nm Co 40 Fe 40 B 20 recording layer coercivity exhibits a size dependence which suggests single domain behavior for diameters ≤ 100 nm. Focusing on devices with diameters smaller than 100 nm, we determine the effect of voltage and size on the effective device anisotropy K eff using two different techniques. K eff is extracted both from distributions of the switching fields of the recording and reference layers, and from measurement of thermal fluctuations of the recording layer magnetization when a field close to the switching field is applied. The results from both sets of measurements reveal that K eff increases monotonically with decreasing junction diameter, consistent with the size dependence of the demagnetization energy density. We demonstrate that K eff can be controlled with a voltage down to the smallest size measured, 64 nm. PACS numbers: 85.75.-d,73.40.Gk,75.78.-n,75.70.-i 1 I. INTRODUCTION Magnetic tunnel junctions (MTJs) with perpendicular magnetic anisotropy (PMA) are an attractive building block for non-volatile memories. PMA MTJs (p-MTJs) show promisein terms of the key requirements for implementation into products competitive with current data storage and memory technologies: large tunnel magnetoresistance (TMR), low writing energy cost, non-volatility over ∼ 10 years, and scalability of these properties toward ∼ 1 Tbit/inch 2 densities. Room temperature TMR ratios greater than 100% have long existed in in-plane MTJs 1,2 . In state of the art in-plane MTJs, TMR in excess of 600% is achieved by controlling the diffusion of Ta in the film stack through the addition of boron to the magnetic electrodes 3 . Despite these achievements, in-plane MTJs suffer from scalability issues due to their dependence on shape anisotropy for thermal stability and the high energy cost of switching the magnetization by the spin transfer torque (STT) effect 4,5 . For in-plane MTJs, switching energies E sw = I 2 c Rt, where I c is the critical switching current, R is the resistance, and t is the length of the pulse, of approximately 10 µJ/bit were achieved for current pulses on the order of 10 ms 6 . This value was drastically reduced using nanosecond pulses, yielding E sw on the order of single pJ/bit in purely in-plane MTJs 7 . In high TMR p-MTJs the large out-of-plane demagnetization energy does not contribute to E sw 8 . Recently, TMR ratios up to 162% were obtained in p-MTJs by further controlling interlayer diffusion through the substitution of Ta with Mo in the film stack 9 . PMA is achieved when the CoFeB thickness is less than about 1.5 nm, so that the effective anisotropy K eff is dominated by the interfacial anisotropy between Fe in the CoFeB and oxygen in the MgO 10 . In such p-MTJs, switching energies of hundreds of fJ/bit were achieved in 60 nm × 170 nm ellipses 11 . One of the most promising aspects of p-MTJs is that the interface anisotropy can be controlled by applying a...
The magnetic stray field is an unavoidable consequence of ferromagnetic devices and sensors leading to a natural asymmetry in magnetic properties. Such asymmetry is particularly undesirable for magnetic random access memory applications where the free layer can exhibit bias. Using atomistic dipole-dipole calculations we numerically simulate the stray magnetic field emanating from the magnetic layers of an magnetic memory device with different geometries. We find that edge effects dominate the overall stray magnetic field in patterned devices and that a conventional synthetic antiferromagnet structure is only partially able to compensate the field at the free layer position. A granular reference layer is seen to provide near-field flux closure while additional patterning defects add significant complexity to the stray field in nanoscale devices. Finally we find that the stray field from a nanoscale antiferromagnet is surprisingly non-zero arising from the imperfect cancellation of magnetic sublattices due to edge defects. Our findings provide an outline of the role of different layer structures and defects in the effective stray magnetic field in nanoscale magnetic random access memory devices and atomistic calculations provide a useful tools to study the stray field effects arising from a wide range of defects.
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