Abstract:In this work High Velocity Oxy-fuel (HVOF) thermal spray techniques, spraying process optimization, and characterization of coatings are reviewed. Different variants of the technology are described and the main differences in spray conditions in terms of particle kinetics and thermal energy are rationalized. Methods and tools for controlling the spray process are presented as well as their use in optimizing the coating process. It will be shown how the differences from the starting powder to the final coating formation affect the coating microstructure and performance. Typical properties of HVOF sprayed coatings and coating performance is described. Also development of testing methods used for the evaluation of coating properties and current status of standardization is presented. Short discussion of typical applications is done.

Magnetic shape memory (MSM) alloys or ferromagnetic shape memory alloy (FSMA) materials discovered by Ullakko et al (1996 Appl. Phys. Lett. 69 1966 have received increasing interest, since they can produce a large strain with rather high frequencies without a change in the external temperature. These materials have potential for actuator and sensor applications. MSM materials exhibit giant magnetic field induced strain (MFIS) based on the rearrangements of the crystallographic domains (twin variants). The magnetization energy of the material is lowered when such twin variants that have the easy axis of magnetization along the field start to grow due to twin boundary motion. Currently, the best working MSM materials are the near-stoichiometric Ni 2 MnGa Heusler alloys in which the properties are highly composition dependent. Their modulated martensitic structures, 5M and 7M, show 6% or 10% response respectively in a magnetic field less than 800 kA m −1 . The MSM service temperature of the 5M alloys is between 150 and 333 K, and the optimal frequency region is up to 500 Hz. The fatigue life of the MSM elements has been shown to be at least 50 × 10 6 shape change cycles. This paper reviews the research work carried out at

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Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic process enable the growth of conformal thin films with precise thickness control and sharp interfaces. A multilayered thin film, which is nanolaminate, can be grown using ALD with tuneable electrical and optical properties to be exploited, for example, in the microelectromechanical systems. In this work, the tunability of the residual stress, adhesion, and mechanical properties of the ALD nanolaminates composed of aluminum oxide (Al2O3) and titanium dioxide (TiO2) films on silicon were explored as a function of growth temperature (110–300 °C), film thickness (20–300 nm), bilayer thickness (0.1–100 nm), and TiO2 content (0%–100%). Al2O3 was grown from Me3Al and H2O, and TiO2 from TiCl4 and H2O. According to wafer curvature measurements, Al2O3/TiO2 nanolaminates were under tensile stress; bilayer thickness and growth temperature were the major parameters affecting the stress; the residual stress decreased with increasing bilayer thickness and ALD temperature. Hardness increased with increasing ALD temperature and decreased with increasing TiO2 fraction. Contact modulus remained approximately stable. The adhesion of the nanolaminate film was good on silicon.

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