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In this work, the application of tris(N,N′-diisopropyl-formamidinato)yttrium(iii) [Y(DPfAMD)3] as a precursor in a water-assisted thermal atomic layer deposition (ALD) process for the fabrication of device quality Y2O3 thin films is demonstrated.

The synthesis and characterization of a series of closely related Y(III) compounds comprising the formamidinate ligands (RNCHNR) (R = alkyl) is reported, with the scope of using them as prospective...

Development of two new neodymium containing precursors and their successful implementation in the MOCVD of luminescent Nd2S3 thin films.

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