We report a study of the effect of postgrowth treatment of ZnGeP2 single crystals (low-temperature annealing, irradiation with fast electrons, polishing of working surfaces) and the conditions of exposure to repetitively pulsed laser radiation [wavelength (2091 or 1064 nm), pulse repetition rate, beam diameter, exposure time, sample temperature] on the laser-induced damage threshold (LIDT) of the surfaces of these crystals. It is found that thermal annealing of ZnGeP2 single crystals and their irradiation with a flux of fast electrons, which increase the LIDT at a wavelength of λ = 1064 nm, do not lead to a change in this threshold at λ = 2091 nm. It is shown that ZnGeP2 elements with lower optical losses in the spectral range 0.7 – 2.5 μm have a higher LIDT at λ = 2091 nm both immediately after fabrication and after postgrowth processing. An increase in the threshold energy density of laser radiation by a factor of 1.5 – 3 at λ = 2091 nm is revealed with a decrease in the crystal temperature from zero to –60 °C. The fact of reversible photodarkening of the propagation channel of laser radiation in ZnGeP2 in the predamage region of parameters is established by the method of digital holography.
The paper defined the laser-induced damage threshold from the fluence and the peak power of GaSe and GaSe:In single crystals upon exposure to nanosecond radiation in the two micron range and assessed the influence of test radiation energy parameters (pulse repetition rate, pulse duration) on the damage threshold. Laser-induced damage threshold was determined with the parameters of the incident radiation close to the pump radiation parameters of promising dual-wavelength optical parametric oscillators (effective pump sources for THz difference frequency oscillators): wavelength was ≈2.1 μm; pulse repetition rates were 10, 12, 14, and 20 kHz; and pulse durations were 15, 18, 20, and 22 ns. The obtained results made it possible to conclude that the value of GaSe damage threshold at a wavelength of 2.091 μm of the incident radiation was influenced by the accumulation effects (the damage threshold decreased as the pulse repetition rate increased). The accumulation effects were more significant in the case of the In-doped sample, since a more significant decrease in the damage threshold was observed with increasing frequency in terms of the peak power and the fluence.
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