Study subjects under review are in four major categories: the exposure system and fluid containment; fluids; the optics; and the wafer processing. This paper reports results from all four categories.
High-n Immersion System ConceptsWater-based immersion tools currently operate with the design goal of keeping the wafer dry of water, both before, and after, the wafer is passed under the stationary immersion system showerhead. This goal is achieved by the properties of the immersion water itself. Water has a high surface tension and a high contact angle to the resist or topcoat surface on the wafer. Water is therefore relatively easily constrained under the showerhead, even when the wafer is scanned at speeds of 600mm/sec.
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