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The surface morphology and crystalline quality of GaN layers grown by metalorganic chemical vapor deposition on sapphire (0001) substrates were investigated for various thermal treatment conditions of low-temperature (LT)-grown GaN buffer layers. The surface morphology and crystalline quality of subsequently grown high-temperature (HT) GaN layers strongly depended on thermal effects during the temperature ramping process after LT growth of the buffer layers. We have found that the defect density and structure are affected by this temperature ramping process, and that the generation of growth pits is closely related to defects in the HT-GaN layers. High-quality HT-GaN layers with specular surface morphology were obtained with optimum growth and ramping conditions for the LT-GaN buffer layers. Furthermore, the role of thermal treatment during the temperature ramping process was identified, and mechanisms of nucleus formation, HT-growth initiation on the LT-GaN buffer layers, and defect formation are proposed and discussed.

A 20‐inch, largest OLED display in the world is demonstrated which is driven by “Super Amorphous Silicon” technology. It has been widely believed that the characteristics of amorphous silicon TFT is not sufficient to drive OLED display. This paper turns over the hypothesis to prove that amorphous silicon can be applied to the large active‐matrix driven displays. Novel approaches to enable amorphous silicon to drive bright and long life OLED display are shown to open a bright future to realize larger OLED televisions.

We demonstrate room temperature pulsed operation of nitride based multi-quantum-well (MQW) laser diodes with cleaved mirror facets grown on a conventional C-face sapphire substrate. Cleavage was performed along the <11*BAR*2*BAR*0> direction of the sapphire substrate, and the resultant facet was analyzed using an atomic force microscope (AFM) and theoretical calculation. A single peak emisson, at a wavelength of 417.5 nm, with a full width at half-maximum of 0.15 nm, was obtained. The threshold current density of the laser was 50 kA/cm2 and a voltage for the threshold current was 20 V.

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