In this study, the morphological properties and micro‐roughness of chromium thin film prepared by thermal evaporation technique and confirmed via EDS analysis are examined on different substrates of BK7, Silicon (Si), and glass using atomic force microscope analysis (AFM). Analysis of amplitude parameters, Minkowski functionals, and films' spatial microtexture extracted from AFM analysis showed the difference between glass substrate and the other two (BK7 and Si) substrates for the growth of chromium thin films. In addition, we observed robust signatures of multifractality of the Cr thin films deposited on all substrates we studied. Moreover, we highlight that the Glass substrates displayed the strongest multifractality indicating that such samples present space filling properties distributed over more spatial scales than the samples of BK7 and Si.
In this study, TiO2 films were deposited on the glass and silicon substrates at different pressures using a DC magnetron sputtering system. Surface topography, fractality, particle size, transparency spectra, and roughness of the deposited films were analyzed through atomic force microscopy (AFM) in non-contact mode and spectrophotometer (UV-visible) analysis. The surface morphology, absorption spectra, transparency, and conductivity of the films were studied through analytical and mathematical relations, including fractal and multifractal dimensions of the films. The pressure influenced the particle size leading to the changes in the surface roughness and fractality of the films. When the working pressure increased above 8×10− 3 Torr, the nonuniformity in the distribution of surface properties and multifractality increased. Additionally, using optical data and the Tauc ́s method, their energy gap was calculated. It was revealed that the TiO2 coatings have a relatively large energy gap of ~ 4eV, probably due to their small grain size.
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