High resolution while maintaining high peak reflectivities can be achieved for Lamellar Multilayer Amplitude Gratings (LMAG) in the soft-x-ray (SXR) region. Using the coupled waves approach (CWA), it is derived that for small lamellar widths only the zeroth diffraction order needs to be considered for LMAG performance calculations, referred to as the single-order regime. In this regime, LMAG performance can be calculated by assuming a conventional multilayer mirror with decreased density, which significantly simplifies the calculations. Novel analytic criteria for the design of LMAGs are derived from the CWA and it is shown, for the first time, that the resolution of an LMAG operating in the single-order regime is not limited by absorption as in conventional multilayer mirrors. It is also shown that the peak reflectivity of an LMAG can then still be as high as that of a conventional multilayer mirror (MM). The performance of LMAGs operating in the single-order regime are thus only limited by technological factors.

Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

Cleaning of contamination of optical surfaces by amorphous carbon (a-C) is highly relevant for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for a-C removal from a Si surface. By comparing a-C removal in a surface wave discharge (SWD) plasma and an EUV-induced plasma, the cleaning mechanisms for hydrogen and helium gas environments were determined. The C-atom removal per incident ion was estimated for different sample bias voltages and ion fluxes. It was found that H 2 plasmas generally had higher cleaning rates than He plasmas: up to seven times higher for more negatively biased samples in EUV induced plasma. Moreover, for H 2 , EUV induced plasma was found to be 2-3 times more efficient at removing carbon than the SWD plasma. It was observed carbon removal during exposure to He is due to physical sputtering by He + ions. In H 2 , on the other hand, the increase in carbon removal rates is due to chemical sputtering. This is a new C cleaning mechanism for EUV-induced plasma, which we call "EUV-reactive ion sputtering."

An analytic theory describing soft x-ray diffraction by Lamellar Multilayer Gratings (LMG) has been developed. The theory is derived from a coupled waves approach for LMGs operating in the single-order regime, where an incident plane wave can only excite a single diffraction order. The results from calculations based on these very simple analytic expressions are demonstrated to be in excellent agreement with those obtained using the rigorous coupled-waves approach. The conditions for maximum reflectivity and diffraction efficiency are deduced and discussed. A brief investigation into p-polarized radiation diffraction is also performed.

The optical properties of a-periodic, depth-graded multilayer mirrors operating at 13.5 nm wavelength are investigated using different compositions and designs to provide a constant reflectivity over an essentially wider angular range than periodic multilayers. A reflectivity of up to about 60% is achieved in these calculation in the [0, 18 degrees] range of the angle of incidence for the structures without roughness. The effects of different physical and technological factors (interfacial roughness, natural interlayers, number of bi-layers, minimum layer thickness, inaccuracy of optical constants, and thickness errors) are discussed. The results from an experiment on the fabrication of a depth-graded Mo/Si multilayer mirror with a wide angular bandpass in the [0, 16 degrees] range are presented and analyzed.