Composite layers Ni–P + Co, Ni–P + W and Ni–P + Ti
were obtained in galvanostatic conditions, at
jdep = 0.200
A cm−2.
The x-ray diffraction method was used to determine the phase composition of the
layers and atomic absorption spectrometry was applied to specify their chemical
composition. A metallographic microscope, stereoscopic microscope and Form
Talysurf-type profilograph were used for cross-section and surface morphology
characterization of the layers. The behaviour of the obtained layers was
investigated in the process of hydrogen evolution reaction from 5 M KOH using
classical methods (voltammetry, steady-state polarization) and electrochemical
impedance spectroscopy (EIS). Based on recorded steady-state polarization
curves, the Tafel equation parameters for this process were determined. EIS was
used to study the interfacial properties at electrode overpotential ΔE = −0.200
V. It was found that the investigated Ni–P + Co
layer is characterized by increased electrochemical activity
for hydrogen evolution compared to Ni–P + W and Ni–P + Ti
layers. Greater activity of the Ni–P + Co
layer in this process may be attributed to the developed
electrode surface. The values of surface roughness factor
Rf
were also determined.
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