There are various challenges associated with the fabrication of highly ordered magnetic nanostructures on flexible substrates due to the compatibility with lithography and deposition techniques. In this article, we present a nanofabrication technique to synthesize a large area (5 × 5 mm2) of ferromagnetic nanowires on top of a polymer substrate (Kapton®) using interference lithography and sputtering processes. We have systematically characterized their static and dynamic magnetic behaviors using magneto-optical Kerr magnetometry and broadband ferromagnetic resonance spectroscopy. To evaluate the quality of our approach, we also deposited an identical array of nanowires on Silicon substrates for comparison. The nanowires deposited on the two substrates display similar static and dynamic properties, including the identical magnetization reversal process, number of resonance modes, and comparable damping parameters. The results suggest the good quality of our nanowires and their suitability in future flexible spintronic devices.
This work presents the effect of large strains (up to 20%) on the behavior of magnetic nanowires (NiFe) deposited on a Kapton substrate. The multicracking phenomenon was followed by in situ tensile tests combined with atomic force microscopy measurements. These measurements show, on the one hand, a delay in crack initiation relative to the nonpatterned thin film and, on the other hand, a saturation of the length of the nanowire fragments. The latter makes it possible to retain the initial magnetic anisotropy measured after deformation by ferromagnetic resonance. In addition, the ferromagnetic resonance line profile (intensity, width) is minimally affected by the numerous cracks, which is explained by the small variation in magnetic anistropy and the low magnetostriction coefficient of NiFe.
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