XPS study of the degradation mechanism of fluorinated anti-sticking treatments used in UV nanoimprint lithography

Truffier-Boutry, Delphine; Beaurain, A.; Galand, R.; Pelissier, B.; Boussey, J.; Zelsmann, M.

doi:10.1016/j.mee.2009.06.004

Cited by 40 publications

(30 citation statements)

References 12 publications

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“…To investigate the effect of surface chemistry on liquid residue formation, 1 H ,1 H ,2 H ,2 H ‐perfluorooctyltrichlorosilane (PFOS, Figure h) and PFPE polymer brushes (Figure i) were respectively grafted onto the micropatterned surface through silanization reactions . X‐ray photoelectron spectroscopy (XPS) analysis confirms the successful grafting of PFOS and PFPE on the surfaces (Figure f).…”

Section: Surface Tensions and Viscosities Of The Test Liquids And Thmentioning

confidence: 99%

“…Perfluoroalkylsilane coating like PFOS is investigated as it is the most widely used type of coating to enhance the liquid repellency of solid surfaces . PFOS molecules are densely packed on the surface without mobile surface functional groups, thus PFOS‐coated sample can be considered as a conventional solid surface 7b. In contrast, the PFPE polymer chains featuring COC bonding (confirmed by the O1s XPS spectra, Figure g) are highly flexible7a with a glass transition temperature ( T g = −116 °C) much lower than room temperature (bulk PFPE is known to be a liquid) 7b.…”

Section: Surface Tensions and Viscosities Of The Test Liquids And Thmentioning

confidence: 99%

“…PFOS molecules are densely packed on the surface without mobile surface functional groups, thus PFOS‐coated sample can be considered as a conventional solid surface 7b. In contrast, the PFPE polymer chains featuring COC bonding (confirmed by the O1s XPS spectra, Figure g) are highly flexible7a with a glass transition temperature ( T g = −116 °C) much lower than room temperature (bulk PFPE is known to be a liquid) 7b. As only one end of the PFPE chain is covalently grafted to the substrate, the remaining part of the chain keeps its high mobility through free rotation and/or bending.…”

Section: Surface Tensions and Viscosities Of The Test Liquids And Thmentioning

confidence: 99%

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Lossless Fast Drop Self‐Transport on Anisotropic Omniphobic Surfaces: Origin and Elimination of Microscopic Liquid Residue

Huang

Liu

et al. 2019

Advanced Materials

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Surfaces enabling directional drop self‐transport have exceptional applications in digital microfluidics, chemical analysis, bioassay, and microreactor technology. While such properties have been obtained by engineering a surface with anisotropic microstructures, a microscopic liquid residue—though it might be invisible macroscopically—is generally left behind the transported drop, resulting in undesired transport loss and severely limiting practical applications of the surface. Here, the origin of microscopic liquid residue is studied by investigating directional drop self‐transport on anisotropic surfaces made of radially arranged omniphobic microstripes. It is revealed that the occurrence of a liquid residue is governed by a transport‐velocity‐dependent dynamic wetting mechanism involving the formation of entrained thin liquid films at high capillary numbers while the local dynamic receding contact angle vanishes. Rayleigh‐like breakup of the liquid films leads to the microscopic liquid residue. It is further shown that a liquid‐like coating featuring highly flexible molecular chains can effectively suppress the formation of entrained liquid films at high transport velocities, thereby facilitating lossless and fast drop self‐transport on anisotropic omniphobic surfaces.

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Section: Surface Tensions and Viscosities Of The Test Liquids And Thmentioning

confidence: 99%

Section: Surface Tensions and Viscosities Of The Test Liquids And Thmentioning

confidence: 99%

Section: Surface Tensions and Viscosities Of The Test Liquids And Thmentioning

confidence: 99%

See 1 more Smart Citation

Lossless Fast Drop Self‐Transport on Anisotropic Omniphobic Surfaces: Origin and Elimination of Microscopic Liquid Residue

Huang

Liu

et al. 2019

Advanced Materials

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“…2(b)). The coating conditions were as follows: a 24-h dipping time, 100-°C baking temperature, and 3-min baking time [4,18]. To obtain the same initial condition of both molds, GCs were simultaneously etched and treated with release agent in the same condition and time.…”

Section: Ars Mold Fabricationmentioning

confidence: 99%

Lifetime amelioration of antireflection structure molds by means of partial-filling ultraviolet nanoimprint lithography

Talipa]Yusof

Hayashi

Taniguchi

et al. 2015

Microelectronic Engineering

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Release coating layer (RCL) becomes an important element in ultraviolet nanoimprint lithography (UV-NIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong release force (RF) that deteriorates the RCL and affects the lifetime of the ARS mold. In this paper, we proposed a technique of partial-filling UV-NIL in order to reduce the RF and consequently, ameliorate the lifetime of the ARS mold. The release and optical properties of the ARS were measured to determine the lifetime of the mold, and complete-filling UV-NIL was also executed for comparison. By means of partial-filling UV-NIL, we successfully fabricated ARS films with excellent performance up to the 150th imprint, i.e., reflectivity of 0.25 ± 0.15% and transmittance of 94.0 ± 0.50% at visible wavelengths, compared to complete-filling UV-NIL up to the 50th imprint.

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“…However, in 2007, Houle et al identified a premature degradation of their antisticking properties when imprinting into a vinyl-ether 5 or an acrylate-based 6 resist. By examining three different fluorinated antisticking layers ͑F-ASLs͒: Optool DSX, 1H ,1H ,2H ,2H-perfluoro-octyl-trimethoxysilane, 12 and Fluorolink S10 from Solvay-Solexis, 13 we have proven that, independent of the length and composition of the F-ASL molecules, a premature degradation of the F-ASL is always occurring after few tens of imprints into a free radical resist system. 6,9,10 In 2009, we demonstrated that it is possible to quantify the chemical interaction occurring at the mold/resist interface during UV exposure by using electron spin resonance ͑ESR͒.…”

Section: Introductionmentioning

confidence: 99%

Impact of the resist properties on the antisticking layer degradation in UV nanoimprint lithography

Francone

Iojoiu

Poulain

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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In this work, the authors evaluate the impact of chemical and mechanical properties of UV nanoimprint lithography resists on the durability of antisticking treatments applied on the quartz mold surface. To do this, three acrylate-based resists were formulated and characterized. Fourier transform infrared spectroscopy was used to investigate the degree of conversion of each formulation as a function of the exposure dose and electron spin resonance was used to investigate the chemical reactivity of each formulation with respect to a fluorinated antisticking layer ͑Optool DSX from Daikin Chemicals͒. The impact of resist mechanical properties on the mold surface treatment degradation was also studied. Elastic modulus and hardness were measured by nanoindentation as a function of the polymerization degree. Then, these resists were imprinted with a dummy quartz template treated beforehand with the antisticking layer. The release properties of the molds were monitored by measuring their free surface energy as a function of the chemical and mechanical properties of the imprinted resists. A detailed comparative study has shown that release properties degradation is more governed by a mechanical than by a chemical interaction.

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XPS study of the degradation mechanism of fluorinated anti-sticking treatments used in UV nanoimprint lithography

Cited by 40 publications

References 12 publications

Lossless Fast Drop Self‐Transport on Anisotropic Omniphobic Surfaces: Origin and Elimination of Microscopic Liquid Residue

Lossless Fast Drop Self‐Transport on Anisotropic Omniphobic Surfaces: Origin and Elimination of Microscopic Liquid Residue

Lifetime amelioration of antireflection structure molds by means of partial-filling ultraviolet nanoimprint lithography

Impact of the resist properties on the antisticking layer degradation in UV nanoimprint lithography

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