Use of beam-shaping optics for wafer-scaled nanopatterning in laser interference lithography

Weber, Dominik; Heimburger, Robert F.; Hildebrand, Dirk; Junghans, Toni; Schondelmaier, Gianina; Walther, Christian; Schondelmaier, Daniel

doi:10.1007/s00339-019-2538-4

Cited by 11 publications

(5 citation statements)

References 33 publications

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“…It could be beneficial to setups that modify the excitation to enhance resolution by counting photons 52 – 55 but ASTER implementation in such case would be challenging. The resulting uniformity may be used for demultiplexing or stoichiometry experiments 56 , 57 , as well as in buffer characterization and other fields such as photolitography 58 , 59 . Finally, ASTER has potential applications in nonuniform excitation schemes, such as using smaller beams to concentrate power 60 , exciting specific areas of a sample 61 or creating a patterned irradiance on complex samples by using adaptive scanning strategies.…”

Section: Discussionmentioning

confidence: 99%

Fast widefield scan provides tunable and uniform illumination optimizing super-resolution microscopy on large fields

et al. 2021

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Non-uniform illumination limits quantitative analyses of fluorescence imaging techniques. In particular, single molecule localization microscopy (SMLM) relies on high irradiances, but conventional Gaussian-shaped laser illumination restricts the usable field of view to around 40 µm × 40 µm. We present Adaptable Scanning for Tunable Excitation Regions (ASTER), a versatile illumination technique that generates uniform and adaptable illumination. ASTER is also highly compatible with optical sectioning techniques such as total internal reflection fluorescence (TIRF). For SMLM, ASTER delivers homogeneous blinking kinetics at reasonable laser power over fields-of-view up to 200 µm × 200 µm. We demonstrate that ASTER improves clustering analysis and nanoscopic size measurements by imaging nanorulers, microtubules and clathrin-coated pits in COS-7 cells, and β2-spectrin in neurons. ASTER’s sharp and quantitative illumination paves the way for high-throughput quantification of biological structures and processes in classical and super-resolution fluorescence microscopies.

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Section: Discussionmentioning

confidence: 99%

Fast widefield scan provides tunable and uniform illumination optimizing super-resolution microscopy on large fields

et al. 2021

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“…In ref. [36], the authors employed a beam shaper that produces different beam energy profiles, such as a homogenous intensity profile useful for uniform patterning, a flat-top profile for 1D arrays, and a super-Gaussian intensity profile that can be used for grayscale periodic patterning.…”

Section: Challenges and Outlookmentioning

confidence: 99%

Phase Nanoengineering via Thermal Scanning Probe Lithography and Direct Laser Writing

Levati

Girardi

Pellizzi

et al. 2023

Adv Materials Technologies

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Nanomaterials derive their electronic, magnetic, and optical properties from their specific nanostructure. In most cases, nanostructured materials and their properties are defined during the materials growth, and nanofabrication techniques, such as lithography, are employed subsequently for device fabrication. Herein, a perspective is presented on a different approach for creating nanomaterials and devices where, after growth, advanced nanofabrication techniques are used to directly nanostructure condensed matter systems, by inducing highly controlled, localized, and stable changes in the electronic, magnetic, or optical properties. Then, advantages, limitations, applications in materials science and technology are highlighted, and future perspectives are discussed.

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“…Nanosphere lithography is cost-effective and easy to implement [29], but there is still a lack of effective means to control the self-assembly defect [30,31]. Some limitations, such as structural dependence of laser interference lithography [32,33], also characterize other methods. High performance optoelectronic devices are eagerly looking forward to large-scale nano-patterning methods.…”

Section: Introductionmentioning

confidence: 99%

Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer

Fan

Wang

Sun

et al. 2023

Int. J. Extrem. Manuf.

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Surface nanopatterning of semiconductor optoelectronic devices is recognized powerful for improving their quality and performance. However, photoelectric devices' inherent stress sensitivity and inevitable warpage pose a huge challenge on fabricating nanostructures large-scale. Electric-driven flexible-roller nanoimprint lithography for nanopatterning the optoelectronic wafer is proposed in this study. The flexible nanoimprint template twining around a roller is continuously released and recovered, controlled by the roller’s simple motion. The electric field between the template and the substrate provides the all driving force. Under the electric field, the contact line of the template and the substrate gradually moves with the roller to enable scanning and adapting to the entire warped substrate. On the other hand, the driving force generated from electric field is acted on the substrate surface, so the substrate is free from external pressure. Furthermore, liquid resist completely fills in microcavities on the template by powerful electric field force, to ensure the fidelity of the nanostructures. The proposed nanoimprint technology is validated on the prototype. Finally, nano-grating structures are fabricated on a gallium nitride light-emitting diode chip using the proposed solution, achieving the polarization of the light source.

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Use of beam-shaping optics for wafer-scaled nanopatterning in laser interference lithography

Cited by 11 publications

References 33 publications

Fast widefield scan provides tunable and uniform illumination optimizing super-resolution microscopy on large fields

Fast widefield scan provides tunable and uniform illumination optimizing super-resolution microscopy on large fields

Phase Nanoengineering via Thermal Scanning Probe Lithography and Direct Laser Writing

Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer

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