2003
DOI: 10.1016/s0039-6028(03)00455-2
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Understanding the growth mode transition in InAs/GaAs(001) quantum dot formation

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Cited by 31 publications
(21 citation statements)
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“…In the literature, the above experimental observations [89,[123][124][125][126][127][128] have often been taken as strong experimental evidence to support the view that InAs QD formation should be a surface process remarkably similar to adatom aggregation in homoepitaxial growth in the submonolayer regime. However, it will be further demonstrated in Section 4 that the outcome of practical epitaxial growth of InAs QDs depends sensitively on the growth parameters, such as the flux rate F and temperature T ; although some experimental data in the literature obtained under certain growth conditions seem to be consistent with Eqs.…”
Section: Fitting Experimental Data On the Density And Size Distributimentioning
confidence: 81%
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“…In the literature, the above experimental observations [89,[123][124][125][126][127][128] have often been taken as strong experimental evidence to support the view that InAs QD formation should be a surface process remarkably similar to adatom aggregation in homoepitaxial growth in the submonolayer regime. However, it will be further demonstrated in Section 4 that the outcome of practical epitaxial growth of InAs QDs depends sensitively on the growth parameters, such as the flux rate F and temperature T ; although some experimental data in the literature obtained under certain growth conditions seem to be consistent with Eqs.…”
Section: Fitting Experimental Data On the Density And Size Distributimentioning
confidence: 81%
“…In contrast, from the experimental viewpoint, InAs QD formation is definitely a self-limited growth process, and the growth power law s av ∝ θ z for an aggregation process makes no sense for InAs QD growth behavior. Therefore, the apparent fitting of the experimental data reported in these references [89,[123][124][125][126][127][128] may only demonstrate that both the universal laws, Eqs. (3.2.2.9) and (3.2.3.6), are very versatile and flexible in fitting experimental data obtained in a large number of cases, and may provide little insight into the nature of the InAs QD formation process.…”
Section: Fitting Experimental Data On the Density And Size Distributimentioning
confidence: 97%
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“…They presented in situ STM measurements of InAs-QDs grown on GaAs (1 0 0) by MBE and observed two regions, similar to our results. They explained that this step consisted of InGaAs alloy due to InAs and GaAs [13][14][15]. In the case of the Ref sample, InAs-QDs are grown randomly at the two regions because of a lack of sufficient migration time for In.…”
Section: Resultsmentioning
confidence: 99%
“…The substrates were conventional semi-insulating GaAs (1 0 0) wafers. The substrates were cleaned in situ in the main chamber to remove native oxides on the GaAs substrate by a heat treatment at 580 1C for a period of 15 buffer layer was grown at 580 1C and InAs-QDs were then grown at 480 1C. The Ga, In, and As fluxes were 1.75 Â 10 À7 , 7.2 Â 10 À8 , and 5.0 Â 10 À6 Torr, respectively.…”
Section: Methodsmentioning
confidence: 99%