2016
DOI: 10.1073/pnas.1605982113
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Uncovering edge states and electrical inhomogeneity in MoS 2 field-effect transistors

Abstract: The understanding of various types of disorders in atomically thin transition metal dichalcogenides (TMDs), including dangling bonds at the edges, chalcogen deficiencies in the bulk, and charges in the substrate, is of fundamental importance for TMD applications in electronics and photonics. Because of the imperfections, electrons moving on these 2D crystals experience a spatially nonuniform Coulomb environment, whose effect on the charge transport has not been microscopically studied. Here, we report the meso… Show more

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Cited by 106 publications
(123 citation statements)
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“…Therefore ESs are described by a single parameter a for both spins and valleys (we suppressed spin and valley indexes). However, obtained results are also valid when the two spinpolarised ES branches are described by different parameters a +1,τ = a −1,τ (8), while one can populate only one of them in each valley. We will regard that a ∼ 1, so that ES spectra intersect the gap as shown on Fig.3.…”
Section: Spin-valley Edge Photocurrentssupporting
confidence: 54%
“…Therefore ESs are described by a single parameter a for both spins and valleys (we suppressed spin and valley indexes). However, obtained results are also valid when the two spinpolarised ES branches are described by different parameters a +1,τ = a −1,τ (8), while one can populate only one of them in each valley. We will regard that a ∼ 1, so that ES spectra intersect the gap as shown on Fig.3.…”
Section: Spin-valley Edge Photocurrentssupporting
confidence: 54%
“…This is the most critical part of our fabrication process. As discussed in the main text, etched MoS 2 edges have a large number of dangling bonds that can host in-gap edge states 6 and act as adsorption sites for air molecules (O 2 , H 2 O). These adsorbed species could likely hinder covalent bonding between the contact metal (Ti) and MoS 2 , leaving edge states unpassivated, which subsequently act as traps for injected carriers.…”
Section: Metal Deposition and Annealingmentioning
confidence: 99%
“…Considering the following parts are also use MoS 2 as sample, the lumped element model is also applicable for larger than that of three layers (3L) MoS 2 . Besides the influence of layer thickness, local carrier concentration may be influenced by interfacial impurities, strain, disorders and charge transfer [42,43]. Figures 4(d)-(f) are dC/dV amplitude images with different tip bias V G , which are taken in sMIM mode.…”
Section: D Semiconductor Materialsmentioning
confidence: 99%
“…The C-V curves indicate that the carrier concentration of MoS 2 flakes is non-uniform. The carrier concentration difference may be resulting from strain, interfacial impurities, disorders and charge transfer [42,43]. Figures 6(d)-(f) are dC/dV amplitude images with different tip bias V G taken in sMIM mode.…”
Section: Sub-surface Capability: Mos 2 Over Sio 2 /Si With Circular Hmentioning
confidence: 99%