In this paper, we have studied the electrical properties of the randomly distributed metallic (Cu, Ni and Fe) nano-/micro wires on the silicon substrate. Deposition was carried out potentiostatically into the pores of the track-etch polycarbonate membrane spin coated onto the Si substrate. Spin coated films were irradiated with 150 MeV Ni (+11) ions at a fluence of 5E8 ions/cm 2 , followed by Ultra-Violet (UV) irradiation and chemically etching in aqueous NaOH (6N, at room temperature). The size, shape and morphology of the synthesized nano-/micro structures is strongly dependent on the preparation conditions such as deposition potential, current density, electrolyte and etching conditions. Later, morphological and electrical properties of the so-deposited nano-/micro structures were studied.