2000
DOI: 10.1116/1.591211
|View full text |Cite
|
Sign up to set email alerts
|

Ultra-low-energy ion-implant simulation using computational-efficient molecular dynamics schemes and the local damage accumulation model

Abstract: Activation and deactivation in heavily boron-doped silicon using ultra-low-energy ion implantationWe have investigated effects of atomic dynamics for ultra-low-energy As and B ion implants using a highly efficient molecular dynamics scheme. We simulated ion implantation by molecular dynamics simulation using the recoil ion approximation method and the local damage accumulation model proposed in the article. The Local damage accumulation probability function consists of deposited energy in a unit cell, implant … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2002
2002
2009
2009

Publication Types

Select...
3

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(2 citation statements)
references
References 10 publications
(7 reference statements)
0
2
0
Order By: Relevance
“…15 Previous investigations have sought to arrive at a straightforward correlation between the SCM signal and doping concentration in semiconductors. 21 This connection requires either that the dopant density be known at one measured position 14,15,20 or that the dopant profile and doping concentration be extracted only over a narrow range. 22 The absence of a well-established model or algorithm for direct conversion of SCM signal to doping concentration motivated us to employ standard samples with staircase doping profiles, as we did for SSRM.…”
Section: B Scmmentioning
confidence: 99%
“…15 Previous investigations have sought to arrive at a straightforward correlation between the SCM signal and doping concentration in semiconductors. 21 This connection requires either that the dopant density be known at one measured position 14,15,20 or that the dopant profile and doping concentration be extracted only over a narrow range. 22 The absence of a well-established model or algorithm for direct conversion of SCM signal to doping concentration motivated us to employ standard samples with staircase doping profiles, as we did for SSRM.…”
Section: B Scmmentioning
confidence: 99%
“…This method has successfully produced accurate dopant density profiles of ion-implanted semi-conductor wafers [6,7] at ion energies in the range of 10keV-100keV initial energy with minimal empirical fitting of model parameters. The approach has subsequently been reproduced by other groups [8,9] who also studied semiconductor doping by ion irradiation.…”
Section: Introductionmentioning
confidence: 99%