Atmospheric pressure spatial atomic layer deposition (AP-SALD) was used to deposit n-type ZnO and Zn 1-x Mg x O thin films onto p-type thermally oxidized Cu 2 O substrates outside vacuum at low temperature. The performance of photovoltaic devices featuring atmospherically fabricated ZnO/Cu 2 O heterojunction was dependent on the conditions of AP-SALD film deposition, namely, the substrate temperature and deposition time, as well as on the Cu 2 O substrate exposure to oxidizing agents prior to and during the ZnO deposition. Superficial Cu 2 O to CuO oxidation was identified as a limiting factor to heterojunction quality due to recombination at the ZnO/Cu 2 O interface. Optimization of AP-SALD conditions as well as keeping Cu 2 O away from air and moisture in order to minimize Cu 2 O surface oxidation led to improved device performance. A three-fold increase in the open-circuit voltage (up to 0.65 V) and a two-fold increase in the short-circuit current density produced solar cells with a record 2.2% power conversion efficiency (PCE). This PCE is the highest reported for a Zn 1-x Mg x O/Cu 2 O heterojunction formed outside vacuum, which highlights atmospheric pressure spatial ALD as a promising technique for inexpensive and scalable fabrication of Cu 2 O-based photovoltaics.