MRS Proc. 2001 DOI: 10.1557/proc-692-k2.8.1 View full text
Eiichi Kuramochi, Masaya Notomi, Itaru Yokohama, Jun-ichi Takahashi, Chiharu Takahashi, Takayuki Kawashima, Shojiro Kawakami

Abstract: ABSTRACTWe propose a new three-dimensional photonic crystal structure or drilled alternating-layer photonic crystal (DALPC), which can be fabricated by a combination of the deposition of alternating layers of dielectric films and one-time dry etching. Our band calculation predicts that the DALPC has a photonic band gap (PBG) in all directions. We fabricated a Si/SiO 2 DALPC by electron beam lithography, bias sputtering, and fluoride-gas electron cyclotron resonance etching. We measured the light transmission …

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