2020
DOI: 10.1007/s10825-019-01442-z
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Tight-binding description of graphene–BCN–graphene layered semiconductors

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Cited by 8 publications
(11 citation statements)
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“…A bias voltage ( V DS ) of 0.6 V is applied between the drain and source contacts. For a fair comparison with previous studies, a 1 nm layer of silicon dioxide is considered as a gate oxide. A thicker SiO 2 layer reduces the control of the gate over the channel and decreases the switching ratio.…”
Section: Resultsmentioning
confidence: 99%
See 2 more Smart Citations
“…A bias voltage ( V DS ) of 0.6 V is applied between the drain and source contacts. For a fair comparison with previous studies, a 1 nm layer of silicon dioxide is considered as a gate oxide. A thicker SiO 2 layer reduces the control of the gate over the channel and decreases the switching ratio.…”
Section: Resultsmentioning
confidence: 99%
“…In this presented paper, by using lattice-matched BC 2 N instead of graphene as the source and drain regions, and using BN as a tunneling barrier, a lower barrier height is constructed that enhances the switching ratio and subthreshold swing. Besides lateral heterostructure devices, vertical tunneling transistors based on graphene-BCN heterostructures have been proposed. , Although it is easier to fabricate vertical heterostructures than lateral ones, it has some specific disadvantages. Indeed, in the vertical heterostructures, the overlap between gate and source (or drain) regions screens the field induced by the gate.…”
Section: Introductionmentioning
confidence: 99%
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“…pybinding tools are incorporated in python libraries [16]. Quantum tunneling in tunneling MOSFETs and study of sensors based on bottom up approaches have used tight binding models [17]. Also the tight-binding calculations have been used to analyse the transport features and to understand the origin of the various modes of transport in graphene nanoribbons using full-scale quantumtransport simulations [18]- [21].…”
Section: Introduction-graphene Modeling and Applicationsmentioning
confidence: 99%
“…Novel electronic devices have been realized by heterostructures based on vertical stacking or lateral stitching of 2D materials with different elec-tronic properties [6]. Lateral graphene/hexagonal boron nitride (Gr/hBN) heterostructures, due to very low lattice mismatch between graphene and hBN, are most suitable as platforms for fully two-dimensional nanoelectronic devices [7][8][9][10][11].…”
Section: Introductionmentioning
confidence: 99%